Canon Kabushiki Kaisha

Ryo Koizumi

Kazuhiro Takahashi

Jun Moizumi

Daisuke Kobayashi

Koji Mikami

Tadao Nakamura

Kouki Miyano

An exposure apparatus includes a first temperature controller for controlling a temperature distribution on an optical element of a projection optical system, and a second temperature controller for controlling a temperature distribution on an optical element of the projection optical system, wherein in a first period in which the exposure operation is executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration of the projection optical system due to the exposure operation being executed, and in a second period which follows the first period and in which the exposure operation is not executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration due to the exposure operation not being executed.

Exposure apparatus, exposure method, and method of manufacturing article

The present invention provides an exposure method for repeatedly performing an exposure process for exposing a substrate via a projection optical system, the method comprising a first exposure process for measuring optical characteristics of the projection optical system, and exposing the substrate while correcting the optical characteristics based on a result of the measurement; a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of estimating the optical characteristics by a prediction formula, wherein the first exposure process is repeatedly performed, and the second exposure process is started after the first exposure process where it is judged that the determined coefficient of the prediction formula has converged.

Exposure method, exposure apparatus, and method of manufacturing article

This invention provides an exposure apparatus for exposing each of a plurality of shot regions on a substrate. The exposure apparatus includes a control unit configured to control exposure processing of exposing each of the plurality of shot regions on the substrate using control information for controlling shapes of the shot regions exposed on the substrate such that the plurality of shot regions are adjacent to each other. The control information includes correction information for correcting, based on layout information of a plurality of shots adjacent to each other, a shift of adjacent portions of the plurality of shot regions caused by a distortion of the shapes of the plurality of shot regions. The control unit controls the exposure processing using the correction information.

Exposure apparatus and article manufacturing method

The present invention provides a scan-type exposure apparatus comprising an aperture stop provided with at least one of a mask stage and a substrate stage and configured to reduce an influence of flare light, wherein an opening of the aperture stop includes a first opening portion corresponding to one shot region on a substrate, and a serrated second opening portion including a plurality of first openings that protrude in a second direction parallel to the scanning direction from a side of the first opening portion along a first direction perpendicular to the scanning direction, and a length of each of the plurality of first openings in the first direction decreases outward in the second direction from the side of the first opening portion along the first direction.

Exposure apparatus and method of manufacturing article

A method for replacing a lens having refractive power in a first projection optical system includes measuring a wavefront of measuring light passing through the first projection optical system in a state in which the lens having refractive power or a master lens is mounted in the first projection optical system, measuring a wavefront of measuring light passing through a second projection optical system in a state in which the master lens or an alternative lens is mounted in the second projection optical system, processing the alternative lens in accordance with measurement results, and replacing the lens having refractive power in the first projection optical system with the processed alternative lens.

Lens replacing method and manufacturing method for alternative lens

A projection exposure apparatus includes a diaphragm controlling unit controlling one or more of an diaphragm, an iris diaphragm, and a relay lens system. In addition, the projection exposure apparatus also includes a line width calculator which calculates a bias, which is a difference between a line width in a dense part and a line width in an isolated part, based on information regarding a mask pattern, the wavefront aberration of a lens, the effective light source of an illumination optical system, the half-width of a laser, the temperature change in a projection optical system due to exposure, etc. When the bias is out of a tolerance range, the line width calculator calculates a correction value for the diaphragm of the projection optical system or a correction value for the effective light source of the illumination optical system in accordance with the bias which is to be corrected. Then, the diaphragm controlling unit is driven in accordance with the calculation results.

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Saitama, Japan

Ryo Koizumi