Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi, Ltd.

Murata Manufacturing Co., Ltd.

Renesas Electronics Corporation

Ryo Kadoi

Wen Zheng Li

Hiroyuki Takahashi

Hajime Kawano

Kazuki Ikeda

Naoya Ishigaki

Akio Yamamoto

Makoto Suzuki

Norio Hayashi

Satoshi Shimizu

Masami Makuuchi

Shinichi Murakami

Hisaaki Kanai

Yoshikazu Sugiyama

Tomoharu Nagashima

Tomoyo Sasaki

Takayasu Iwatsuka

The invention provides a power supply module and a charged particle beam device that are capable of reducing ripple noise. A high-voltage generation circuitincludes booster circuits CPa and CPb of two systems that are configured to be symmetrical to each other, and performs a boosting operation by using a capacitive element and a diode in the booster circuits CPa and CPb of the two systems. The high-voltage generation circuit is housed in a housing and a reference power supply voltage is applied thereto. A left electrodeis fixedly provided in the vicinity of one of the booster circuits CPa and CPb of the two systems in the housing, and a right electrodeis fixedly provided in the vicinity of the other of the booster circuits CPa and CPb of the two systems in the housing. A stray capacitance adjustment circuitadjusts capacitance values of stray capacitances of the booster circuits CPa and CPb of the two systems by electrically controlling an electrical connection characteristic between the left electrodeand the reference power supply voltageand an electrical connection characteristic between the right electrodeand the reference power supply voltage

Power supply module and charged particle beam device

To provide a technique capable of measuring high-frequency electrical noise in a charged particle beam device. A charged particle beam deviceincludes an electron sourcefor generating an electron beam EB, a stagefor mounting a sample, a detectorfor detecting secondary electrons EBemitted from the sample, and a control unitelectrically connected to the electron source, the stage, and the detectorand can control the electron source, the stage, and the detector. Here, when the sampleis mounted on the stage, and a specific portionof the sampleis continuously irradiated with the electron beam EBfrom the electron source, the control unitcan calculate a time-series change in irradiation position of the electron beam EBbased on an amount of the secondary electrons EBemitted from the specific portion, and can calculate a feature quantity for a shake of the electron beam EBbased on the time-series change in irradiation position. Further, the feature quantity includes a frequency spectrum.

Charged particle beam device and method of measuring electrical noise

Provided is a charged particle beam device capable of improving the accuracy of measurement and processing. The charged particle beam device includes an electrostatic chuck that adsorbs an inspection object, a voltage generation unit that generates a voltage to be supplied to the electrostatic chuck, and a state determination unit that determines a state of the inspection object. Here, the state determination unit includes a current waveform simulation unit that simulates a time-series change of an electrostatic chuck current flowing through the voltage generation unit when the electrostatic chuck normally adsorbs the inspection object, a difference integration unit that acquires an integration value of a difference between a time-series change of a simulation current generated by the current waveform simulation unit and the time-series change of the electrostatic chuck current flowing through the voltage generation unit, and a difference determination unit that determines an adsorption state of the inspection object and a shape feature of the inspection object based on the integration value of the difference.

Charged particle beam device

A plurality of switching units are provided, and a controller performs control in an antiphase manner to approximately synchronize a rise of a control signal applied to one of the switching units with a fall of a control signal for switching applied to any one of the other switching units and synchronize a fall of the control signal applied to the one of the switching units with a rise of the control signal for switching applied to the any one of the other switching units. When control in an antiphase manner is disabled, control is performed to prevent rises or falls from coinciding with each other between the switching units. Output signals from the switching units are input to rectifiers and are combined by a combiner to become an output signal.

Power converter and control method of power converter that reduce ringing

Provided is a technique for specifying a medium more simply. A medium sensor device includes an antenna, a storage unit that stores a medium identification table in which a medium corresponding to an antenna impedance has been determined beforehand, and a medium specification unit that specifies the impedance of the antenna and specifies a medium in the vicinity of the antenna by referring to the medium identification table.

Medium sensor device and monitoring system

A charged particle beam system includes a charged particle beam deviceand the detection circuit. The charged particle beam deviceincludes a first antennahaving a first resonant frequency and a second antennahaving a second resonant frequency. The detection circuitincludes a first amplitude detection unitwhich detects a first amplitude of a signal after passing a first filter, a second amplitude detection unitwhich detects a second amplitude of a signal after passing a second filter, and an amplitude comparison unitwhich compares the first amplitude with the second amplitude.

Charged particle beam system

The present invention prevents breakage of a chip by using a simple configuration even when an extraction-electrode power source cannot apply voltage to an extraction electrode due to a malfunction, etc. This charged particle beam device is provided with: a charged particle source; an extraction electrode that extracts charged particles from the charged particle source; an extraction-electrode power source that applies voltage to the extraction electrode; an accelerating electrode for accelerating the charged particles; an accelerating power source that applies voltage to the accelerating electrode; and a diode and a resistor which are connected in series between a middle stage of the accelerating power source and the output side of the extraction-electrode power source.

A charged particle apparatus including a charged particle source unit; a blanking electrode unit that blanks a charged particle beam launched from the charged particle source unit; a deflecting electrode unit that deflects the charged particle beam; an objective lens unit that converges the charged particle beam deflected by the deflecting electrode unit and radiates the charged particle beam to a surface of a sample; a secondary charged particle detection unit that detects a secondary charged particle generated from the sample; a signal processing unit that processes a signal obtained by detecting the secondary charged particle; and a control unit that corrects a transient signal when the blanking of the charged particle beam is turned off by the blanking electrode, such that an image with no distortion can be obtained even when the blanking electrode is operated to turn on and off at a high speed.

Charged particle beam device with transient signal correction during beam blanking

A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.

There is provided a charged particle beam apparatus radiating a charged particle beam to a specimen so as to acquire an image of the specimen, the charged particle beam apparatus including: a charged particle gun that generates the charged particle beam; an electron optical system that radiates the charged particle beam emitted from the charged particle gun onto a surface of the specimen so as to scan the surface of the specimen; a detecting unit that detects secondary electrons or reflection electrons emitted from the specimen, and converts the electrons into pulse signals; a pulse signal detecting circuit that detects time detecting information regarding time of the pulse signals converted by the detecting unit, and peak value detecting information regarding each peak value of the pulse signals; and an image processing unit that generates luminance gradation of the acquired image based on a time detecting signal and a peak value detecting signal of the pulse signals detected by the pulse signal detecting circuit.

Charged particle beam apparatus and image generation method

To provide a switch circuit in which ON/OFF control can be realized even in a state where high voltage is not applied, and high voltage can be completely lowered to the ground. Provided is a switch circuit that includes plural MOS switches connected in series in such a manner that the source of one element is connected to the drain of another between high voltage and a system ground and that switches a connection state between the high voltage and the system ground, the switch circuit including: a MOS switchthe source of which is connected to the system ground among the plural MOS switches; a MOS switchthe source of which is connected to the drain of the MOS switchin a shared manner and the drain of which is connected to the high voltage side among the plural MOS switches; a MOS switchthe drain of which is connected to the gate of the MOS switchin a shared manner; and a resistorthat is connected in parallel between the gate and the source of the MOS switch

Switch circuit, mass spectrometer, and control method for switch circuit

The present invention provides a processing apparatus using a scanning electron microscope, which includes the scanning electron microscope having an electron optical system radiating and scanning a focused electron beam on a sample placed on a stage to image the sample, and an image processing/control section which controls the scanning electron microscope and processes the image obtained by imaging with the scanning electron microscope. The electron optical system of the scanning electron microscope has image shift electrodes comprised of electrostatic electrodes, the image shift electrodes moving a position at which to apply the focused electron beam onto the sample with the stage stopped to thereby shift a region in which the sample is to be imaged.

Processing apparatus and method using a scanning electron microscope

When the frequency bandwidth of a high frequency signal to be amplified is changed, the linearity of a high frequency module deteriorates. A high frequency module has an amplifier circuit including an amplification transistor and a variable impedance circuit, and an output matching network. Based on an amplifying operation, the amplified high frequency signal will contain unwanted signals of secondary distortion components. In a frequency band that generates such unwanted signals of secondary distortion components, the output impedance of the amplifier circuit is changed so that the impedance will not match between the amplifier circuit and the output matching network. The output impedance of the amplifier circuit is changed by controlling the variable impedance circuit.

High frequency module and portable terminal using same

A high frequency circuit and a high frequency module are provided, in which the accuracy of compensation operation is improved in compensating by digital control. The amplification gain of an amplification element of an amplifier unit is controlled by a bias current of a bias control unit. A process monitoring circuit of a calibration circuit includes a first and a second element characteristic detector and a voltage comparator. The detectors convert the current of replica elements into a first and a second detection voltage. The voltage comparator compares a first and a second detection voltage and supplies a comparison output signal to a search control unit. Responding to the comparison output signal of the comparator and a clock signal of a clock generating unit, the controller generates a multi-bit digital compensation value according to a predetermined search algorithm, and the bias control unit of the second detector is feedback-controlled.

Growing community of inventors

Tokyo, Japan

Ryo Kadoi