Maruzen Petrochemical Company, Limited

Ryo Fujisawa

Kazuhiko Haba

Satoshi Kakuta

Hiromitsu Baba

Teruyo Ikeda

Tomohiro Masukawa

Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Bifunctional (meth)acrylate compound and polymer

[Problem to be Solved] To Provide a method for producing an acid-decomposable polymer having a reduced metal ion content, which suppresses decomposition and deprotection of the acid-decomposable polymer. [Means to Solve the Problem] The method for producing an acid-decomposable polymer according to the present invention comprises the steps of:

Method for producing acid-decomposable polymer

Provided is a method for producing a polymer for an electronic material having a low content of metal ion impurities and a polymer for an electronic material obtained by such method. The method for producing a polymer for an electronic material according to the present invention comprises a polymerization step of obtaining a polymer by polymerizing a monomer(s) and a purification step of adding a strong acid having 0 or less pKa to the polymer solution and subsequently performing an ion exchange treatment to reduce the concentration of the metal ion impurities.

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Ichihara, Japan

Ryo Fujisawa