Qualcomm Incorporated

Ryan David Lane

Charles David Paynter

Xiaonan Zhang

Young Kyu Song

Jonghae Kim

Daeik Daniel Kim

Yue Li

Mario Francisco Velez

Aristotele Hadjichristos

Ruey Kae Zang

Changhan Hobie Yun

Shiqun Gu

Chengjie Zuo

Milind Shah

Chin-Kwan Kim

Siamak Fazelpour

Li-Sheng Weng

Yunseo Park

Jong-Hoon Lee

Shree Krishna Pandey

Xiaoming Chen

Jung Ho Yoon

Edward Reyes

Mark Stephen Veatch

Tom Gregorich

Gurkanwal Singh Sahota

Omar James Bchir

Dong Wook Kim

Kyu-Pyung Hwang

Steven C Ciccarelli

Babak Nejati

Christian Holenstein

Arvind Chandrasekaran

David Ian West

Jianwen Xu

Ratibor Radojcic

Ahmer Raza Syed

Urmi Ray

Justin Joseph Rosen Gagne

Zhongping Bao

Glenn D Raskin

Uei-Ming Jow

William Michael Stone

John D Eaton

Biancun Xie

Amit Mano

Uei Ming Jow

David J Wilding

Tiona Marburger

Eric David Foronda

Milind Pravin Shah

Electronic devices that include a routing substrate with lower inductance path for a capacitor, and related fabrication methods. In exemplary aspects, to provide lower interconnect inductance for a capacitor coupled to a power distribution network in the routing substrate, an additional metal layer that provides an additional, second power plane is disposed in a dielectric layer between adjacent metal layers in adjacent metallization layers. The additional, second power plane is adjacent to a first power plane disposed in a first metal layer of one of the adjacent metallization layers. The disposing of the additional metal layer in the dielectric layer of the metallization layer reduces the thickness of the dielectric material between the first and second power planes coupled to the capacitor as part of the power distribution network. This reduced dielectric thickness between first and second power planes coupled to the capacitor reduces the interconnect inductance for the capacitor.

Providing a lower inductance path in a routing substrate for a capacitor, and related electronic devices and fabrication methods

A package comprising a first integrated device comprising a plurality of first pillar interconnects; an encapsulation layer at least partially encapsulating the first integrated device; a metallization portion located over the first integrated device and the encapsulation layer, wherein the metallization portion includes at least one passivation layer and a plurality of metallization layer interconnects, wherein the plurality of first pillar interconnects is coupled to the plurality of metallization layer interconnects; and a second integrated device comprising a plurality of second pillar interconnects, wherein the second integrated device is coupled to the plurality of metallization layer interconnects through a plurality of second pillar interconnects and a plurality of solder interconnects.

Package comprising integrated devices coupled through a metallization layer

A package comprising a substrate, an integrated device, and an interconnect integrated device. The substrate includes a first surface and a second surface. The substrate further includes a plurality of interconnects. The integrated device is coupled to the substrate. The interconnect integrated device is coupled to a surface of the substrate. The integrated device, the interconnect integrated device and the substrate are configured to provide an electrical path for an electrical signal of the integrated device, that travels through at least the substrate, then through the interconnect integrated device and back through the substrate.

Package comprising a substrate and a high-density interconnect integrated device coupled to the substrate

A device that includes a board, a package and a patch substrate. The board includes a cavity. The package is coupled to a first side of the board. The package includes a substrate and an integrated device coupled to the substrate. The integrated device is located at least partially in the cavity of the board. The patch substrate is coupled to a second side of the board. The patch substrate is located over the cavity of the board. The patch substrate is configured as an electromagnetic interference (EMI) shield for the package.

Patch substrate configured as a shield located over a cavity of a board

An integrated circuit (IC) module that includes an integrated circuit (IC) package, a plurality of first solder interconnects coupled to the IC package, an interposer coupled to the IC package through the plurality of first solder interconnects a plurality of second solder interconnects coupled to the interposer; and a printed circuit board (PCB) coupled to the interposer through the plurality of second solder interconnects. The interposer includes an encapsulation layer, a first passive component at least partially embedded in the encapsulation layer, and a plurality of interconnects coupled to the first passive component. The encapsulation layer includes a mold and/or an epoxy fill. The first passive component is configured to operate as an electronic voltage regulator (EVR) for the IC module. In some implementations, the interposer is a fan out interposer.

Integrated circuit (IC) module comprising an integrated circuit (IC) package and an interposer with embedded passive components

Some novel features pertain to an integrated device that includes a first metal layer and a second metal layer. The first metal layer includes a first set of regions. The first set of regions includes a first netlist structure for a power distribution network (PDN) of the integrated device. The second metal layer includes a second set of regions. The second set of regions includes a second netlist structure of the PDN of the integrated device. In some implementations, the second metal layer further includes a third set of regions comprising the first netlist structure for the PDN of the integrated device. In some implementations, the first metal layer includes a third set of regions that includes a third netlist structure for the PDN of the integrated device. The third set of regions is non-overlapping with the first set of regions of the first metal layer.

Staggered power structure in a power distribution network (PDN)

A toroid inductor includes a plurality of first turns configured in a first ring shape and a plurality of second turns configured in a second ring shape. The plurality of first turns includes a plurality of first upper interconnects, a plurality of first lower interconnects, and a plurality of first vias coupled to the plurality of first upper interconnects and to the plurality of first lower interconnects. The plurality of second turns is at least partially intertwined with the plurality of first turns. The plurality of second turns includes a plurality of second upper interconnects, a plurality of second lower interconnects, and a plurality of second vias coupled to the plurality of second upper interconnects and to the plurality of second lower interconnects.

Toroid inductor with reduced electromagnetic field leakage

An embedded layered inductor is provided that includes a first inductor layer and a second inductor layer coupled to the first inductor layer. The first inductor layer comprises a patterned metal layer that may also be patterned to form pads. The second inductor layer comprises metal deposited in a dielectric layer adjacent the patterned metal layer.

Embedded layered inductor

Some novel features pertain to a package substrate that includes a core layer, a first via, a first dielectric layer, and a first inductor. The core layer includes a first surface and a second surface. The first via is located in the core layer. The first dielectric layer is coupled to the first surface of the core layer. The first inductor is located in the first dielectric layer. The first inductor is coupled to the first via in the core layer. The first inductor is configured to generate a magnetic field that laterally traverses the package substrate. In some implementations, the package substrate further includes a first pad coupled to the first inductor, wherein the first pad is configured to couple to a solder ball. In some implementations, the package substrate includes a second via located in the core layer, and a second inductor located in the first dielectric layer.

Inductor embedded in a package substrate

Some features pertain to an integrated device that includes a substrate, several metal layers coupled to the substrate, several dielectric layers coupled to the substrate, and a redistribution portion coupled to one of the metal layers. The redistribution portion includes a first metal redistribution layer, an insulation layer coupled to the first metal redistribution layer, and a second metal redistribution layer coupled to the insulation layer. The first metal redistribution layer, the insulation layer, and the second metal redistribution layer are configured to operate as a capacitor in the integrated device. In some implementations, the capacitor is a metal-insulator-metal (MIM) capacitor.

Metal-insulator-metal (MIM) capacitor in redistribution layer (RDL) of an integrated device

The disclosure is related to pin layouts in a semiconductor package. One embodiment of the disclosure provides a rhombus shaped shared reference pin layout that isolates a set of differential pin pairs. The differential signal pin pairs are configured such that an axis formed by a vertical signal pin pair is orthogonal to and mutually bisecting an axis formed by a lateral signal pin pair.

Apparatus and methods for shielding differential signal pin pairs

A package on package semiconductor structure includes a first package positioned above a first surface of a substrate, a second package positioned above the first package, and a first thermal element positioned between the first package and the second package, wherein the first thermal element is separated from the second package by an air gap and the thermal element provides a heat path for heat generated by the first package.

Systems and methods for thermal dissipation

Some novel features pertain to package substrates that include a substrate having an embedded package substrate (EPS) capacitor with equivalent series resistance (ESR) control. The EPS capacitor includes two conductive electrodes separated by a dielectric or insulative thin film material and an equivalent series resistance (ESR) control structure located on top of each electrode connecting the electrodes to vias. The ESR control structure may include a metal layer, a dielectric layer, and a set of metal pillars which are embedded in the set of metal pillars are embedded in the dielectric layer and extend between the electrode and the metal layer. The EPS capacitor having the ESR control structure form an ESR configurable EPS capacitor which can be embedded in package substrates.

Embedded package substrate capacitor with configurable/controllable equivalent series resistance

A semiconductor package for a side by side die configuration may include a substrate having a cavity, a bridge interposer positioned within the cavity and having an active side facing active sides of a first die and a second die and partially horizontally overlapping the first die and the second die to provide an interconnection between the first die and the second die, and a thermal element attached to backsides of the first die and the second die to provide a heat path and heat storage for the first die and the second die.

System, apparatus, and method for split die interconnection

Some implementations provide an integrated device that includes a capacitor and an inductor. The inductor is electrically coupled to the capacitor. The inductor and the capacitor are configured to operate as a filter for an electrical signal in the integrated device. The inductor includes a first metal layer of a printed circuit board (PCB), a set of solder balls coupled to the PCB, and a second metal layer in a die. In some implementations, the capacitor is located in the die. In some implementations, the capacitor is a surface mounted passive device on the PCB. In some implementations, the first metal layer is a trace on the PCB. In some implementations, the inductor includes a third metal layer in the die. In some implementations, the second metal layer is an under bump metallization (UBM) layer of the die, and the third metal is a redistribution layer of the die.

High quality factor filter implemented in wafer level packaging (WLP) integrated device

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San Diego, CA, United States of America

Ryan David Lane