Az Electronic Materials USA Corp.

Other

Henkel Ag & Company, Kgaa

National Starch and Chemical Investment Holding Corporation

Az Electronic Materials (luxembourg) S.a.r.l.

Braggone Oy

Ruzhi Zhang

David J Abdallah

Osama M Musa

Mark O Neisser

PingHung Lu

WooKyu Kim

M Dalil Rahman

Hengpeng Wu

Ping-Hung Lu

Ralph R Dammel

Francis Michael Houlihan

Douglas S McKenzie

Bing T Wu

Hong Zhuang

Elizabeth Wolfer

JiHoon Kim

Nikola A Nikolic

Woo-Kyu Kim

David Shenfield

Allen G Timko

Hwail Jin

Bharatkumar K Patel

Jihoon Kim

Douglas Mckenzie

This invention relates generally to silicon based photoresist compositions that can be used in forming low k dielectric constant materials suitable for use in electronic devices, methods of their use and the electronic devices made therefrom.

Low dielectric photoimageable compositions and electronic devices made therefrom

A polymer comprising a siloxane polymer having at least one Si&#x2014;OH group and at least one Si&#x2014;OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40&#xb0; C. as measured by GPC is provided.

Silicon-based antireflective coating compositions

The present invention relates to a composition comprising: where Ris a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.

Silicone coating composition

The invention relates to compositions and methods of removing silicon-based anti-reflective coatings/hardmask layers.

Stripper for coating layer

The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.

Antireflective coating composition comprising fused aromatic rings

The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, where, Ris selected from C-Calkyl. The invention also relates to a process for imaging this composition.

Antireflective coating composition based on silicon polymer

High silicon-content resin composition that can be used to form thin film thermosets, useful in forming low k dielectric constant materials and as well as hard mask materials with anti-reflective properties for the photolithography industry are disclosed.

High silicon-content thin film thermosets

The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where Rto Ris independently selected from H, (C-C) alkyl and aromatic group, Rand Rare independently (C-C) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.

Antireflective coating compositions

An assembly of a semiconductor die attached to a substrate is made with a composition comprising compounds that contain an oxazoline functionality and an electron acceptor or an electron donor functionality. Electron donor functionalities include styrenic, cinnamyl, and vinyl ether groups. Electron acceptor functionalities include maleimide, acrylate, fumarate, and maleate groups. An exemplary compound has the structure: formula (I). 

Assembly of a semiconductor die attached to substrate with oxazoline derivative bearing an electron donor or acceptor functionality

Difunctional oxazoline resins, which may be produced in a convenient one-step reaction from an arylalkylene dinitrile by reaction with an amino alcohol, are used in compositions with an additional curable compound or resin containing one or more carbon to carbon double bonds. The composition can be cured to a thermoset material, the curing mechanism occurring by the zwitterion polymerization of the bisoxazoline resin with the resin containing the one or more carbon to carbon double bonds. The reaction occurs without the need for curing initiators.(I) 

Curable liquid compositions containing bisoxazoline

This invention is a film adhesive prepared from an adhesive composition comprising a polymer system, a film forming rubber compound, and curing agents for the polymeric system. The polymer system comprises a base polymer and electron donor and electron acceptor functionality.

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Pennington, NJ, United States of America

Ruzhi Zhang