Lam Research Corporation

Russell Ormond

Hong Shih

John Edward Daugherty

Lin Xu

Tom Stevenson

Sivakami Ramanathan

Robert G O'Neill

John Michael Kerns

William Charles

David M Schaefer

Chin-Yi Liu

Nash W Anderson

In accordance with this disclosure, there are provided several inventions, including a substrate processing apparatus with multi-layer surfaces configured to face the plasma and resist against corrosion. These multi-layer surfaces may in one example include a base layer of aluminum, anodized aluminum, or quartz, a second layer of stabilized zirconia, and a second layer of a yttrium-aluminum composite such as yttrium aluminum garnet (YAG).

Long lifetime thermal spray coating for etching or deposition chamber application

A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.

Dense oxide coated component of a plasma processing chamber and method of manufacture thereof

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San Jose, CA, United States of America

Russell Ormond