Cymer, Inc.

Asml Netherlands B.v.

Russell Allen Burdt

Kevin M O'Brien

Herman Philip Godfried

Joshua Jon Thornes

Tanuj Aggarwal

Frank Everts

Matthew Minakais

Thomas Patrick Duffey

John T Melchior

Kuo-Tai Teng

Kumar Raja Guvindan Raju

David Wesley Manley

Systems for maintaining light sources for semiconductor photolithography in which a module making up part of the light source is evaluated at various pulse counts to produce a binary prediction as to whether the module is sufficiently likely to operate without failure in an ensuing sequence of pulses. The binary prediction may be made by a machine learning model trained on metrics extracted from measurements taken on deinstalled modules. A group of models, each trained differently, can be made available according to a selection made by the user or according to the maintenance objectives of the user.

Maintenance of modules for light sources used in semiconductor photolithography

A method of generating a test for a radiation source for a lithographic apparatus comprises a step of receiving data corresponding to a plurality of firing patterns of the radiation source. The method further comprises the step of analyzing the data to determine parameters for configuring one or more further firing patterns for testing the radiation source. The parameters are determined such that a stability of the radiation source when executing the one or more further firing patterns configured using the parameters is substantially the same as, or within predefined bounds relative to, a stability of the radiation source when executing the plurality of firing patterns. Furthermore, parameters are determined such that a total duration of the one or more further firing patterns when executed by the radiation source will be less than a duration of the plurality of firing patterns when executed by the radiation source.

Radiation source testing

A system includes a laser source configured to generate one or more bursts of laser pulses and a data collection and analysis system. The data collection and analysis system is configured to receive, from the laser source, data associated with the one or more bursts of laser pulses and determine, based on the received data, that the one or more bursts of laser pulses are for external use. The data collection and analysis system is further configured to determine, based on the received data, whether the one or more bursts of laser pulses are for an on-wafer operation or are for a calibration operation.

Burst statistics data aggregation filter

Information relating to an etalon is accessed, the etalon being associated with a calibration parameter having a pre-set default value, the etalon being configured to produce an interference pattern including a plurality of fringes from a received light beam, and the information relating to the etalon including first spatial information related to a first fringe of the plurality of fringes and second spatial information related to a second fringe of the plurality of fringes. A first wavelength value of the received light beam is determined based on the spatial information related to the first fringe and an initial value of the calibration parameter. A second wavelength value of the received light beam is determined based on the spatial information related to the second fringe and the initial value of the calibration parameter. The first wavelength value and the second wavelength value are compared to determine a measurement error value.

Determination of measurement error in an etalon

Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.

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San Diego, CA, United States of America

Russell Allen Burdt