Kla-Tencor Technologies Corporation

Carl-Zeiss-Smt Ag

Cymer, Inc.

Russel Hudyma

William N Partlo

Wilhelm Ulrich

Hans-Juergen Mann

Palash P Das

David R Shafer

Hwan J Jeong

Gregory Kirk

Shiow-Hwei Hwang

An optical system may include an objective having at least four mirrors including an outermost mirror with aspect ratio &#x3c;20:1 and focusing optics including a refractive optical element. The objective provides imaging at numerical aperture &#x3e;0.7, central obscuration &#x3c;35% in pupil. An objective may have two or more mirrors, one with a refractive module that seals off an outermost mirror's central opening. A broad band imaging system may include one objective and two or more imaging paths that provide imaging at numerical aperture &#x3e;0.7 and field of view &#x3e;0.8 mm. An optical imaging system may comprise an objective and two or more imaging paths. The imaging paths may provide two or more simultaneous broadband images of a sample in two or more modes. The modes may have different illumination and/or collection pupil apertures or different pixel sizes at the sample.

Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths

A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Reflective projection lens for EUV-photolithography

Growing community of inventors

San Ramon, CA, United States of America

Russel Hudyma