Bruker Nano Gmbh

Russ Mead

Charles Meyer

Johannes Kindt

Daniel Lyons

A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached.

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Goleta, CA, United States of America

Russ Mead