Waymo LLC

Nikon Corporation

Ruslan Kurdyumov

Daniel Trawick Egnor

Andrew Barton-Sweeney

Nolan McPeek-Bechtold

James Harris

Spencer Alexander

Ryan Cash

Michael B Binnard

Eric Peter Goodwin

A method and system are provided for controlling braking a vehicle in an autonomous driving mode. For instance, the vehicle is controlled in the autonomous driving mode according to a first braking control mode using a first model to adjust the position of a vehicle relative to an expected position of a current trajectory of the vehicle. Using a second model how close to a maximum deviation threshold the vehicle would come if a maximum braking strength for the vehicle was applied is predicted. The maximum deviation threshold provides an allowed forward deviation from the current trajectory. Based on the prediction, the vehicle is controlled in the autonomous driving mode according to a second braking control mode by automatically applying the maximum braking strength.

Braking control behaviors for autonomous vehicles

The disclosure relates to controlling braking behaviors a vehicle in an autonomous driving mode in the event of a hydraulic system failure. For instance, the vehicle may be controlled in the autonomous driving mode according to a first braking control behavior based on a first relationship between position of a brake pedal of the vehicle and amount of deceleration for the vehicle. While controlling the vehicle, a failure of a hydraulic system may be determined. Based on the determination, the vehicle may be controlled in the autonomous driving mode according to a second braking control behavior by moving the brake pedal until the vehicle reaches a deceleration target defined by the second braking control behavior.

Braking control behaviors for autonomous vehicles during hydraulic system failure

System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.

Array of encoders for alignment measurement

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San Francisco, CA, United States of America

Ruslan Kurdyumov