General Electric Company

Globalfoundries Inc.

Ge Homeland Protection, Inc.

Ge Precision Healthcare LLC

Ge Healthcare Bio-sciences Corp.

Morpho Detection, Inc.

Rui Chen

Minghao Tang

Radislav Alexandrovich Potyrailo

Yuping Ren

Anthony John Murray

Steven Francis LeBoeuf

Xuefeng Wang

Bo Li

Dongyue Yang

Bradley Morgenfeld

Haiting Wang

Wei Zhang

Scott Beasor

Cung D Tran

Ravi Prakash Srivastava

Anis Zribi

Xintuo Dai

Cheng-Po Chen

Alexey V Vert

Wei Zhao

Anping Zhang

Sanggil Bae

An-Ping Zhang

Peter Joseph Codella

Pavan Kumar Chinthamanipeta Sripadarao

Md Motasim Bellah

Arnaud Comment

Ming Hao Tang

Yida Xu

Alexei Vasilievich Vertiatchikh

Huaxiang Li

Christian J Ayala

Kripa Nidhan Chauhan

Ruilong Xie

Hui Zang

Jinping Liu

Jiehui Shu

Robert John Filkins

Ernst Wolfgang Stautner

Renato Guida

William Hullinger Huber

Reed Roeder Corderman

Sean Xuan Lin

Andrew Michael Leach

Shao Beng Law

Marko Klaus Baller

Min-Yi Shih

Todd Ryan Tolliver

Colin Craig McCulloch

Vicki Herzl Watkins

Jonathan Alan Murray

Fiona Ginty

Nannan Chen

Oliver Charles Boomhower

Zhengyu Pang

Azar Alizadeh

Xiaoyong Liu

Hanna Elina Viertio-Oja

Joleyn Eileen Balch

Genevieve Beique

Erik Geiss

Jan Henrik Ardenkjaer-Larsen

Ganesh Chandan Gangadharan

Patrick Lively Padgett

Zheng G Chen

Albert Chen

Michael S Lazare

Zhiyong Wang

Albert Po-Fu Chen

Matthew Damian Pietrzykowski

James Richard Trigger

Peter Paul Gipp

Manuel Alfred Palacios

Galen Reed

Jonathan Murray

Xun Xiang

Manuel Palacios

A system for drawing a solution is provided. The system includes a filter, a vacuum source, and an actuator. The filter has an input port, a first output port, a second output port, and a flow path defined in part by the input port and the second output port. The vacuum source is in fluid communication with the first output port and operative to apply a vacuum to the flow path. The actuator is operative to facilitate movement of the solution along the flow path.

System and method for drawing a solution

In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.

Structure and method to improve overlay performance in semiconductor devices

One illustrative example of an overlay mark disclosed herein includes four quadrants (I-IV). Each quadrant of the mark contains an inner periodic structure and an outer periodic structure. Each of the outer periodic structures includes a plurality of outer features. Each of the inner periodic structures includes a plurality of first inner groups, each of the first inner groups having a plurality of first inner features, each first inner group being oriented such that there is an end-to-end spacing relationship between each first inner group and a selected one of the outer features.

Asymmetric overlay mark for overlay measurement

A method of forming isolation pillars for a gate structure, the method including: providing a preliminary structure including a substrate having a plurality of fins thereon, an STI formed between adjacent fins, an upper surface of the STIs extending higher than an upper surface of the fins, and a hardmask over the upper surface of the fins and between adjacent STIs; forming a first trench in a first selected STI and between adjacent fins in a gate region, and forming a second trench in a second selected STI and between adjacent fins in a TS region; and filling the first and second trenches with an isolation fill thereby forming a first isolation pillar in the gate region and a second isolation pillar in the TS region, the first and second isolation pillars extending below the upper surface of the STIs.

Isolation pillar first gate structures and methods of forming same

This disclosure relates to a structure for aligning layers of an integrated circuit (IC) structure that may include a first dielectric layer positioned above a semiconductor substrate having one or more active devices, a trench stop layer positioned above the first dielectric layer, a second dielectric layer positioned above the trench stop layer, and a plurality of metal-filled marking trenches extending vertically through the second dielectric layer and the trench stop layer and at least partially into the first dielectric layer. The metal-filled trenches are electrically isolated from any active devices contained in the IC.

Mark structure for aligning layers of integrated circuit structure and methods of forming same

Methods of multiple patterning. First and second mandrel lines are formed on a patternable layer. Sidewall spacers are formed on the patternable layer adjacent to the first mandrel line and adjacent to the second mandrel line. A portion of the first mandrel line is removed to form a gap in the first mandrel line. A gapfill material is deposited in the gap in the first mandrel line. The gapfill material and sidewall spacers are composed of the same material.

Multiple patterning with variable space mandrel cuts

A cooling system is provided. The cooling system is associated with a dynamic nuclear polarization system and configured to cool a sample to a temperature suitable for dynamic nuclear polarization to be carried out on the sample while the sample is in the cooling system. The cooling system includes a cryogenic chamber that includes a cryogenic fluid. The cooling system also includes a removable sample sleeve insertable within a portion of the cryogenic chamber. The removable sample sleeve is configured to define a sample path for the sample within the cryogenic chamber that is isolated from other parts of the cooling system.

Fluid path insert for a cryogenic cooling system

Methods of self-aligned multiple patterning. A mandrel line is formed over a hardmask layer, and forming a block mask is formed over a first portion of the mandrel line that is linearly arranged between respective second portions of the mandrel line. After forming the first block mask, the second portions of the mandrel line are removed with an etching process to cut the mandrel line and expose respective portions of the hardmask layer. A second portion of the mandrel line is covered by the block mask during the etching process to define a mandrel cut in the mandrel line.

Multiple patterning with mandrel cuts formed using a block mask

A method for sterilizing a membrane comprising an oxidoreductase enzyme, comprises: irradiating with gamma radiation the membrane comprising an oxidoreductase enzyme soaked in an aqueous buffer solution. Associated biosensors and bioreactors are also described.

Method for sterilizing membrane comprising glucose oxidase and associated bio-sensor

Methods of fabricating an interconnect structure. A first sacrificial layer is deposited over a dielectric layer, and a block mask is formed that covers an area on the first sacrificial layer. A second sacrificial layer is deposited over the block mask and the first sacrificial layer. After the block mask is formed, the second sacrificial layer is patterned to form a mandrel that is arranged in part on a portion of the block mask.

Interconnects with cuts formed by block patterning

The present invention provides a microscope slide for analyzing a tissue sample. The slide includes an elongate planar substrate, which comprises a first major surface having a sample-affixing area within which a tissue sample may be affixed; a first positive control sample affixed on the first major surface at a first location adjacent to the sample-affixing area; and a second positive control sample affixed on the first major surface at a second location adjacent to the sample-affixing area. The first and second locations are spaced such that quality of the staining of the first and second positive control samples is indicative of the quality of the staining of the tissue sample. Also provided are a kit containing the microscope slide and a method of making and a method of using the microscope slide.

Microscope slides with quality controls thereon

A method for sterilizing a membrane comprising an oxidoreductase enzyme in an environment having a relative humidity, comprises: irradiating the membrane comprising an oxidoreductase enzyme with gamma radiation under vacuum at a relative humidity lower than the relative humidity of the environment. Associated biosensors are also described.

Method for sterilizing membrane comprising an oxidoreductase enzyme and associated biosensor

A biosensing FET device, comprising a plurality of nanostructured SOI channels, that is adapted to operate in solutions having a high ionic strength and provides improves sensitivity and detection. Generally, the biosensing device comprises an underlying substrate layer, an insulator and a semiconductor layer and a plurality of channels in the semiconductor layer comprising a plurality of whole or partially formed nanopores in the channels.

Nanostructured devices for detecting and analyzing biomolecules

The present invention is directed to methods of acetate quantification and acetate complexes useful in the methods of acetate quantification. Such methods and complexes are useful for any application where acetate quantification is desired, including measuring of concentration ofC hyperpolarized acetate for imaging agent quality control in MRI and NMR spectroscopy. The disclosed acetate complexes may be prepared from acetate, Fe, and sulfosalicylic acid and from acetate, Fe, and salicylic acid.

Acetate complexes and methods for acetate quantification

Growing community of inventors

Clifton Park, NY, United States of America

Rui Chen