Carl Zeiss Smt Gmbh

Ruediger Mack

Norbert Wabra

Boris Bittner

Sonja Schneider

Ricarda Schoemer

Martin Von Hodenberg

Eva Schneider

Maike Lorenz

Johannes Schurer

Vladimir Mitev

Tim Hoffmann

An optical assembly has an optical element for influencing the beam path in a projection exposure apparatus and an actuator device for deforming the optical element. The actuator device has at least one photostrictive component and at least one light source. The photostrictive component is mechanically coupled to the optical element for the transmission of a tensile and/or compressive force in order to deform the optical element. The light source is configured for targeted illumination of the photostrictive component in order to induce the tensile and/or compressive force in the photostrictive component.

Optical assembly, method for deforming an optical element, and projection exposure system

Aberrations of a projection lens for microlithography can be subdivided into two classes: a first class of aberrations, which are distinguished by virtue of the fact that their future size increases by a non-negligible value after a constant time duration, independently of their current size, and a second class of aberrations, which, after reaching a threshold, only increase by a negligible value after each further time duration. An adjustment method is proposed, which adjusts these two classes of aberrations in parallel in time with one another.

System correction from long timescales

Growing community of inventors

Langenau, Germany

Ruediger Mack