Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Ruediger Duesing

Stephan Six

Bernhard Gellrich

Alexandra Pazidis

Gennady Fedosenko

Michael Widmann

Michael Lill

Tilmann Von Papen

Thomas Ihl

Andreas Schubert

An optical arrangement for immersion lithography, having at least one component () to which a hydrophobic coating () is applied, the hydrophobic coating () being exposed to UV radiation during operation of a projection lens, and the at least one component () being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating () includes at least one UV-resistant layer () that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same

An optical element () made of a material that is transparent to wavelengths in the UV region, which optical element () includes an oleophobic coating () outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element () within its optically free diameter comprises an oleophilic coating () that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.

Optical element, projection lens and associated projection exposure apparatus

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Neu-Ulm, Germany

Ruediger Duesing