Globalfoundries Singapore Pte. Ltd.

Rudy Octavius Sihombing

Chai Ean Gill

Tsung-Che Tsai

Yohann Frederic Michel Solaro

A method of forming a HV lateral PNP BJT with a pulled back isolation structure and a polysilicon gate covering a part of the NW+HVNDDD base region and a part of the collector extension (HVPDDD) and the resulting device are provided. Embodiments include forming a DVNWELL in a portion of a p-sub; forming a HVPDDD in a portion of the DVNWELL; forming a LVPW in a portion of the HVPDDD; forming a first and a second NW laterally separated in a portion of the DVNWELL, the first and second NW being laterally separated from the HVPDDD; forming a N+ base, a P+ emitter, and a P+ collector in an upper portion of the first and second NW and LVPW, respectively; forming a STI structure between the P+ emitter and P+ collector in a portion of the DVNWELL, HVPDDD, and LVPW, respectively; and forming a SAB layer over the STI structure.

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Singapore, Singapore

Rudy Octavius Sihombing