International Business Machines Corporation

Agency for Science, Technology and Research

Central Glass Company, Limited

Institute of Bioengineering and Nanotechnology

Agency for Science, Technology

Shin-etsu Chemical Co., Ltd.

Institute of Bioengineering and Nanotechnology, Biomedical Sciences Institute

Taclov, LLC

Rudy J Wojtecki

James L Hedrick

Dylan J Boday

Jeannette M Garcia

Mareva B Fevre

Yi Yan Yang

Nathaniel H Park

Jason T Wertz

Theodore Gerard Van Kessel

Amos Cahan

Zhen Chang Liang

Ekmini Anuja De Silva

Daniel Sanders

Xin Ding

Gregory Breyta

Gavin O Jones

Willy Chin

Brandon M Kobilka

Ratnam Sooriyakumaran

Dario Leonardo Goldfarb

Nelson M Felix

Satoru Narizuka

Alshakim Nelson

Hoa D Truong

Mu San Zhang

Noel Arellano

Takehisa Ishimaru

Hariklia Deligianni

Chuan Yang

Daniel A Corliss

Pei-Yun S Hsueh

Robert J Ono

James Lupton Hedrick

Ashlynn Lingzhi Lee

Alexander Edward Hess

Son Van Nguyen

Tsutomu Ogihara

Takeru Watanabe

Seiichiro Tachibana

Thomas Guthrie Zimmerman

Keisuke Niida

Takashi Sawamura

Wei Cheng

Zhi Xiang Voo

Hiroko Nagai

Xiyu Ke

Shaoqiong Liu

Noah F Fine Nathel

Eunice Leong

YiYan Yang

Yang Chuan

Hosadurga K Shobha

Damon B Farmer

Kamal Kumar Sikka

Nicholas Anthony Lanzillo

Cornelius Brown Peethala

Matthew Warren Copel

Teddie Peregrino Magbitang

Charles Thomas Rettner

Ankit Vora

Amanda Catherine Engler

Manabu Yasumoto

Wei Han

Thomas J Haigh, Jr

Balasubramanian S Pranatharthi Haran

Prasad Bhosale

Alexander M Friz

Hareem Tariq Maune

Ashlynn L Z Lee

Shrinivas Venkataraman

Julian M W Chan

Magi Mettry

Eunice Leong Jiayu

Jeanette M Garcia

Embodiments of the invention provide self-assembled monolayers (SAM) formulations and cleaning to promote quick depositions. A hydrogen-based plasma clean is performed on a structure, the structure including a metal layer and a dielectric layer. A self-assembled monolayers (SAM) solution is dispensed on the structure, the SAM solution including SAMs and a solvent, the SAMs being configured to assemble on the metal layer. The structure is rinsed with a rinse solution including the solvent.

Sam formulations and cleaning to promote quick depositions

A composition, process, and device are disclosed. The composition includes a polymer formed by reacting an epoxy compound with an amine curing agent. The epoxy compound comprises a Diels-Alder dimer and an ester moiety. The process includes providing a polymer formed by reacting the epoxy compound with the amine curing agent. The device includes a material that includes the polymer.

Rehealable and reworkable polymer for electronic packaging

A depolymerization reaction of a polyester input with an organocatalyst and an alcohol solvent produces (i) a recycled monomeric or oligomeric diester from the polyester, (ii) the organocatalyst for reuse, and (iii) the alcohol solvent, which may also be reused. The presence of volatile impurities, such as water, acetyl aldehyde, and organic solvents can interfere with the success of the depolymerization reaction. A pre-reaction distillation step removes volatile impurities from the polyester input resulting in an efficient depolymerization reaction with consistency among batches. The polyester input may be further treated with a water azeotrope to remove water from the polyester input prior to the pre-reaction distillation.

Polyester recycling process with pre-reaction purification

A stimulus-responsive micellar carrier, methods that may be associated with making a stimulus-responsive micellar carrier, and methods that may be associated with using a stimulus-responsive micellar carrier are disclosed. The stimulus-responsive micellar carrier comprises a cargo molecule, and a linear block copolymer having a hydrophilic block connected to a hydrophobic block by a stimulus-responsive junction moiety. The micellar carrier can be supplied to a patient body for therapeutic purposes, such as the treatment of cancerous tissue. A method of preparing or obtaining a stimulus-responsive micellar carrier may include preparing a polyethylene glycol material having an acetal end group and then preparing a block copolymer by forming a reaction mixture including the polyethylene glycol material, a cyclic carbonate monomer, and a base.

Stimulus-responsive micellar carrier

Embodiments are provided for fabrication of superconducting devices using area-selective deposition of a metal nitride. In some embodiments, a method can include providing a thermally treated carbon layer, and selectively depositing a metal nitride using the thermally treated carbon layer for formation of a superconducting device.

Area-selective deposition of metal nitride to fabricate devices

In an embodiment is provided a polymer that includes a plurality of N-J-N or N&#x2014;C&#x2014;S repeating units, wherein each J is independently a carbon atom, an alkyl group, or an aryl group; a plurality of hydrophilic groups bonded with the repeating units; and a plurality of hydrophobic groups bonded with the hydrophilic groups and the repeating units. In another embodiment is provided hydrogels of such polymers. The hydrogels may be used as delivery vehicles for various payloads. In another embodiment is provided methods of forming such polymers.

Hydrogels from dynamic covalent networks

A process of forming a treated clay composition, a process of decaffeination, and a treated clay composition are shown. The process of forming the treated clay composition includes providing a first solution of caffeine molecules and non-caffeine molecules, extracting the caffeine molecules to form a pretreatment solution, and bringing a clay composition into contact with the pretreatment solution to form the treated clay composition, on which at least one of the non-caffeine molecules is adsorbed. The process of decaffeination includes providing a solution of caffeine and non-caffeine molecules, and bringing the solution into contact with a treated clay composition. The treated clay composition includes organic molecules adsorbed on mineral layers of a clay. The organic molecules are non-caffeine molecules from a pretreatment solution.

Pretreated clay composition and process for selective removal of planar molecules from solutions

Antibacterial coatings and methods of making the antibacterial coatings are described herein. A first branched polyethylenimine (BPEI) layer is formed and a first glyoxal layer is formed on a surface of the BPEI layer. The first BPEI layer and the first glyoxal layer are cured to form a crosslinked BPEI coating. The first BPEI layer can be modified with superhydrophobic moieties, superhydrophilic moieties, or negatively charged moieties to increase the antifouling characteristics of the coating. The first BPEI layer can be modified with contact-killing bactericidal moieties to increase the bactericidal characteristics of the coating.

Prevention of biofilm formation

The subject matter of this invention relates to hydrogel compositions and, more particularly, to hydrogel compositions comprising block copolymers (BCPs) capable of self-assembly into nanoparticles for the delivery and controlled release of therapeutic cargos.

Biodegradable hydrogel and methods for use thereof

Materials which react with ('scavenge') sulfur compounds, such as hydrogen sulfide and mercaptans, are useful for limiting sulfur-induced corrosion. Surface-modified particles incorporating a hexahydrotriazine moiety are disclosed and used as sulfur scavengers. These surface-modified particles are used a filter media in fixed filter systems and as additives to fluids including sulfur compounds. The hexahydrotriazine moiety can react with sulfur compounds in such a manner as to bind sulfur atoms to the surface-modified particles, thus allowing removal of the sulfur atoms from fluids such as crude oil, natural gas, hydrocarbon combustion exhaust gases, sulfur polluted air and water. The surface-modified particles may, in general, be sized to allow separation of the particles from the process fluid by sedimentation, size-exclusion filtration or the like.

Sulfur scavenging materials

Materials and methods for preparing a payload-containing microcapsule with walls that have hexahydrotriazine (HT) and/or hemiaminal (HA) structures are disclosed. To an HT small molecule or a HA small molecule, or a combination thereof, in a solvent is added a cross-linking agent, NHCl, and a copolymer. The solution is acidified, and a payload agent is added. The HT small molecule and HA small molecule may have orthogonal functionality.

Method to generate microcapsules with hexahydrotriazine (HT)-containing shells

A patterning method is described that utilizes self-assembled monolayers (SAMs) formed with hydroxamic acid compounds and area selective atomic layer deposition (ALD). In the examples, regions of the SAM exposed to extreme ultraviolet radiation (EUV) become resistant to ALD deposition. Subsequent treatment of the exposed SAM to an ALD process results in selective growth of an ALD film on the non-exposed regions of the SAM, leaving the exposed regions substantially free of ALD material.

EUV patterning of monolayers for selective atomic layer deposition

A lithographic patterning method includes forming a multi-layer patterning material film stack on a semiconductor substrate, the patterning material film stack including a resist layer formed over one or more additional layers, and forming a metal-containing top coat over the resist layer. The method further includes exposing the multi-layer patterning material film stack to patterning radiation through the metal-containing top coat to form a desired pattern in the resist layer, removing the metal-containing top coat, developing the pattern formed in the resist layer, etching at least one underlying layer in accordance with the developed pattern, and removing remaining portions of the resist layer. The metal-containing top coat can be formed, for example, by atomic layer deposition or spin-on deposition over the resist layer, or by self-segregation from the resist layer.

Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography

Growing community of inventors

San Jose, CA, United States of America

Rudy J Wojtecki