Balzers Aktiengesellschaft

Unaxis-balzers Aktiengesellschaft

Mitsubishi Denki Kabushiki Kaisha

Unaxis Trading Ag

Rudolf Wagner

Hans Hirscher

Jacques Schmitt

Jerome Perrin

Renzo Zanardo

J G Van Agtmaal

Aitor Galdos

Markus Bruderer

Bader Martin

Moll Eberhard

A process for the vacuum treatment of workpieces, includes loading the workpieces into a treatment facility, surface treating the workpieces in at least one vacuum station of the facility grouped as a station batch and controlling at least the timing of the process by a freely programmable process controller unit. At least two stations operating each on workpiece batches can be grouped as respective station batches and be different with respect to number of workpieces. The workpieces can be transported to and from the grouped stations. An embodiment of vacuum treatment system for such a process includes at least one vacuum treatment station for workpieces grouped as a station batch. A transport system supplies the vacuum station with workpieces. A process controller unit has an output operationally connected to a drive arrangement for the transport system. The unit controls operating timing of the treatment system and is freely programmable.

Processes for vacuum treating workpieces, and corresponding process equipment

A vacuum arrangement with a vacuum disc valve. A support plate is movably guided along a wall with an opening that is closed or opened by a valve. A seal plate is provided on the support plate which is controlled and actuated through a cylinder chamber. When the support plate is moved, the seal plate is displaced in the direction of the opening and is tightly placed on the borders of said opening by actuation in the cylinder chamber. The resulting sealing forces are absorbed by the movement guides of the support plate.

Vacuum system with a vacuum plate valve

A method of manufacturing workpieces, includes loading the workpieces into a treatment facility, surface treating the workpieces in at least one vacuum station of the facility grouped as a station batch and controlling at least the timing of the process by a freely programmable process controller unit. At least two stations operating each on workpiece batches can be grouped as respective station batches and be different with respect to number of workpieces. The workpieces can be transported to and from the grouped stations. An embodiment of vacuum treatment system for such a process includes at least one vacuum treatment station for workpieces grouped as a station batch. A transport system supplies the vacuum station with workpieces. A process controller unit has an output operationally connected to a drive arrangement for the transport system. The unit controls operating timing of the treatment system and is freely programmable.

Process for vacuum treating workpieces, and corresponding process equipment

Process for handling workpieces and apparatus therefor

Vacuum processing plant with a small footprint for the surface treatment of large-area substrates in a virtually upright position, has a vacuum chamber containing a substrate carrier rotatable about a central axis and with at least one processing station mounted on its periphery. A transfer chamber is also mounted on its periphery and connects it to a load-lock chamber. A first transport mechanism moves the substrates from the transfer chamber in a radial direction in and out of the vacuum chamber, a second transport mechanism moves the substrates in a direction perpendicular to that of the first transport mechanism, between the transfer chamber and the load-lock chamber. A third transport mechanism moving in parallel with the second one doubles the transport capacity between the load-lock chamber and the transfer chamber.

Vacuum apparatus for the surface treatment of workpieces

For the transmission of heat under vacuum conditions to a workpiece, a carrier is used with gas outlets and gas return openings distributed on its surface. A dynamic gas layer is thus formed between the carrier and the workpiece wherein the gas effects thermal conduction between the carrier and the workpiece. The gas outlets terminate in a distribution space implemented as a groove and has at least on slot shaped aperture extending substantially around most of the carrier periphery.

Workpiece carrier with suction slot for a disk-shaped workpiece

A valve arrangement comprises a stationary tubular wall with a cover plate defining a housing and an opening in the wall. A second coaxial tubular wall or valve element acts as a closure element for closing the opening with seals acting through axial displacement relative to the stationary wall. This allows for a very compact construction with simultaneous good flow conditions. The valve arrangement can also be directly integrated into a pump housing whereby the use of available space is further improved. The low force expenditure for the closing operation as well as the possibility of continuously controlling the flow for the valve are further advantages.

Tubular valve arrangement

In order to treat disk-shaped bodies, specifically semiconductor disks in a vacuum plant, they must be transported and deposited between stations. A given disk is supported at its edge by two supporting arms each having two fingers and supporting surfaces at four edge sections of the disk distributed along the circumference of the disk. In order to grasp or release the disk by decreasing or increasing the distance between the supporting arms, both supporting arms are mounted to a respective piston/cylinder unit. In such units a respective cylinder moves relative to a stationary piston rod. The ends of both piston rods are thereby mounted oppositely of each other to a rotation axle extending perpendicularly to the axes of the cylinders by means of which the two piston/cylinder units can be pivoted together with the supporting arms from one station to the other station within the vacuum plant. The two piston/cylinder units are operated by a pressurized medium fed via conduits through the hollow piston rods to move the supporting arms away from each other and against the action of a pressure spring positioned inside of the cylinder and resting against the cylinder and the piston and active for the opposed stroke movement.

Supporting and transport apparatus

An elevating table has a housing with a workpiece support movably guided in an upward and downward direction by which a disk-shaped workpiece is transportable into a processing chamber of a vacuum installation. To correct the position of the workpiece placed by a machine into the workpiece support, as well as for securing the workpiece during transport, holding elements are disposed on opposite sides of the elevating table. These comprise in each instance a rod at the end of a jib which is disposed on a shaft rotatably supported in the elevating table and which is rotatable by a motor within a pivotal range in order to bring the holding element into one of two different positions. With two holding elements disposed next to each other on one side of the elevating table and one holding element disposed on the opposite side of the elevating table, the position of the workpiece on the workpiece support can be corrected. A disk disposed at the each of each rod of the holding element extends over the edge of the workpiece and secures it during upward transport. The holding element is then pivoted outwardly by the motor and comes to lie with the disk underneath a covering to be protected against the effects the surface treatment of the workpiece in the processing chamber.

Elevating table and transporting method

For the transmission of heat under vacuum conditions to a workpiece, a carrier is used with gas outlets and gas return openings distributed on its surface. A dynamic gas layer is thus formed between the carrier and the workpiece wherein the gas effects thermal conduction between the carrier and the workpiece. The gas outlets terminate in a distribution space implemented as a groove.

Workpiece carrier for a disk-shaped workpiece as well as a vacuum

A vacuum apparatus for treating disk-shaped workpieces includes a central distribution chamber into which the workpieces are brought from a lock through a communication opening which can be closed by a closing member. A transporting mechanism, preferably in the form of a robot arm, is located in the distribution chamber which is adjoined by intermediate chambers distributed along its circumference as exchangeable modules whereby the communication between them can be shut off at each point of connection by a closing member. An intermediate chamber communicates with at least one treatment chamber via an allocated communication opening which, in order to allow a separation of the treatment chamber, is accessible from the intermediate chamber. In the intermediate chamber a further transport mechanism is arranged for taking over the workpieces from the first transport mechanism, which further transport mechanism places the workpieces onto an elevating table located under the treatment chamber. The table forwards the workpiece into the allocated treatment chamber and separates it thereby at the same time from the distribution chamber. Preferably a plurality of treatment chambers are allocated to each intermediate chamber. The closing members at the communication openings between the chambers are controlled during the treatment procedures so that no undesired passing of gases and particles from one treatment station into the other is possible.

Vacuum apparatus

An installation for the transmission of heat energy between a carrier and a small plate receives a gas between the small plate and the carrier in order to improve the transmission of heat. The same gas serves to press the small plate against the carrier by means of a removable cover. When, for example, in a vacuum process, plate-like objects, such as semiconductors are to be processed, they are frequently heated up to elevated temperatures. Here it is suitable to provide the heat energy in a controlled homogeneous way. In other cases the small plates have to be cooled down in a controlled and steady way. The invention provides an apparatus for both processes.

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Fontnas, Switzerland

Rudolf Wagner