Other

Lithoptek LLC

Periodic Structures, Inc.

Applied Materials, Inc.

Tokyo Electron Limited

Rudolf H Hendel

Catherine G Lin-Hendel

Mark L Schattenburg

John Glenn

David A Markle

Hwan J Jeong

John S Petersen

Michael Carcasi

Paul E Glenn

Kuo-Shih Liu

A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.

Apparatus and method for using scanning light beam for film or surface modification

Systems and methods for enabling a viewer of a motion art form to select an object of interest from within the motion art form are disclosed. The system includes a computing device configured to: receive at least one selection signal from at least one viewer; synchronize the at least one selection signal with an elapse time of the motion art form; and transmit the at least one selection signal to a destination.

Method and system to conduct electronic commerce through motion pictures or life performance events

A method and apparatus in which retroreflective materials and surfaces are used for determining the position, orientation and scale of work pieces in order to accurately place process beams thereon for the purpose of surface patterning or treatment.

Detection of position, orientation and scale of work pieces using retroreflective surfaces

A sealable pipe adaptor is mounted directly on a hydrocarbon well head. A central branch is used for a drilling operation. The central branch has a first valve that is normally open and controllable during the drilling operation. The first valve contains a first sensor that is a shut-off sensor that shuts the first valve when a gush of oil or gas flow above a first preset safety threshold is detected. A first side branch has a second valve that is controllable during the drilling operation and during a production mode. The first side branch valve has a second sensor that opens the second valve when detecting a rogue hydrocarbon flow so that the rogue hydrocarbon flow is directed through the first side branch. The first side branch is connected to storage. A second side branch is connected to a production pipe. The first side branch has a third valve controllable from a production collection terminal. The third valve is normally closed during the drilling operation and is normally open during the production mode. The third valve contains a third sensor that is a shut-off sensor that shuts the third valve when a gush of oil or gas flow that is above a second preset safety threshold is detected.

Enhanced hydrocarbon well blowout protection

Systems and methods for protecting against cyber threats are disclosed. The system includes an external network accessing layer (ENAL) and a core computing asset overlaid by the ENAL. The ENAL comprises at least one external network access cell (ENAC), wherein the at least one ENAC contains at least one communications port, one or more processors, working and storage memories and is configured to be connectable to an external network and to inspect data received from the external network. The core computing asset is overlaid by the ENAL and comprises at least one core computer configured to not be connected to the external network but to be capable of being connected to the ENAL. The core computing asset contains data and software that are to be protected from cyber threat.

System and method for the protection of computers and computer networks against cyber threats

A system for enhancing well safety comprises a pipe equipped with a one-way check valve preventing hydrocarbon up flow through the well casing pipe. The one-way check valve opens in response to encountering downward pressure from downward insertion of fluid or objects moving downward towards a well reservoir. The one-way check valve closes in response to encountering upward pressure from fluid from the well reservoir.

Protection at a hydrocarbon well is enhanced by placing a blowout preventer over a well head. An adapter is connected to the blowout preventer. The adapter includes a valve that when turned off prevents non-production flow from the blowout preventer to a riser pipe.

A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.

Exposure dose homogenization through rotation, translation, and variable processing conditions

Method and system to conduct electronic commerce through motion pictures of life performance events

Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.

Apparatus and method of direct writing with photons beyond the diffraction limit

Method of direct writing with photons beyond the diffraction limit

Interference lithography (IL) system and methods are disclosed according to embodiments of the invention. Two beams of coherent light with a first phase difference expose a first interference pattern on a nonlinear photoresist. A second interference pattern may be exposed on the nonlinear photoresist using the same coherent light beams with a second phase difference. The difference between the first and second phase differences is between 70&#xb0; and 270&#xb0;. The ensuing pattern is a composite of the first and second interference patterns. The IL may employ a third and fourth light beam.

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Los Gatos, CA, United States of America

Rudolf H Hendel