Amo Development, LLC

Intralase Corporation

Newport Corporation

Ruben Zadoyan

Guy Holland

Michael A Karavitis

Marcel Bouvier

Ferenc Raksi

Zsolt Bor

Christopher Horvath

Tibor Juhasz

Michael Otter

Ronald Michael Kurtz

Peter Goldstein

Tommaso Baldacchini

Zolt Bor

Mike White

Guy V Holland

Guy Vern Holland

Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

Method for scanning a pulsed laser beam

Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.

System and method for scanning a pulsed laser beam

System and method are disclosed for in-situ monitoring of a specimen while undergoing a defined process. The system includes a processing system adapted to perform the defined process on the specimen, and a coherent anti-Stokes Raman scattering (CARS) microscopy system adapted to in-situ monitor the specimen. In another aspect, the CARS microscopy system is adapted to in-situ monitor the specimen simultaneous with the defined process being performed on the specimen by the processing system. In still another aspect, the CARS microscopy system is adapted to perform a measurement of the specimen while the defined process being performed on the specimen is paused or temporarily halted.

System and method for monitoring in-situ processing of specimens using coherent anti-Stokes Raman scattering (CARS) microscopy

A method of photoaltering a material using a pulsed laser beam includes selecting a first pulse energy and a first focal point separation based on a relationship of pulse energy and focal point separation combinations enabling layer separation of the material by photoalteration, and scanning the pulsed laser beam along a scan region at the first pulse energy and the first focal point separation. The relationship has a slope and has a distinct change in the slope. The distinct change in the slope is associated with a second pulse energy of the relationships and the first pulse energy is equal to or less than the second pulse energy.

Method of making sub-surface photoalterations in a material

A system for laser amplification includes a dual-crystal Pockels cell which is used to control emission of laser pulses from an ultra-fast laser. The Pockels cell is constructed to enable adjustment of the rotational orientation of one crystal relative to the other crystal. The rotational orientation of one or both crystals in the Pockels cell is adjusted to control sidebands in the laser pulse.

Method and system for laser amplification using a dual crystal pockels cell

A system for adaptive laser scanning correction includes a laser scanner coupled to a controller. The controller develops control signals for the laser scanner for a directed scan pattern that is modified to compensate for a characteristic scan-pattern distortion introduced by the laser scanner. The laser scanner responds to the control signals to provide an actual scan pattern approaching a target scan-pattern shape. The system may be useful for ophthalmologic laser surgery and other applications requiring precise control over scan pattern shape and a high scanning speed.

Adaptive pattern correction for laser scanners

The present invention provides a method for minimizing fluence distribution of a laser over a predetermined pattern. In particular, the method is useful for minimizing fluence variance over a predetermined pattern for lasers used in ophthalmic surgery.

Apparatus and method for correction of aberrations in laser system optics

Method and system for laser amplification using a dual crystal Pockels cell

The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a reference plane. More particularly, the invention relates to a method and system for determining the angle of tilt of a planar surface in relation to a laser beam, and using the determined angle of tilt to calculate a correction factor to be applied to the laser beam. Briefly stated, the method and system ultimately calculates a correction factor, z-offset, that is applied when using the laser beam in a procedure.

Method and system for determining the alignment of a surface of a material in relation to a laser beam

The invention is directed to an apparatus and method for oscillator start-up control, and more particularly to an apparatus and method for overdriving a laser to obtain mode-lock operation. The oscillator with start-up control has a lasing medium mounted on a base. A laser pumping source is mounted on the base for inducing a laser beam from the lasing medium. A mode-lock detection device is mounted about the base. An overdrive circuit is coupled with the mode-lock detection and signal processing device for determining mode-lock status of the oscillator. The overdrive circuit overdrives the pump source when the oscillator is not in mode-lock status.

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Irvine, CA, United States of America

Ruben Zadoyan