Asml Netherlands B.v.

Ruben Alvarez Sanchez

Alexander Ypma

Boris Menchtchikov

Hakki Ergün Cekli

Peter Ten Berge

Michael James Lercel

Chenxi Lin

Simon Hendrik Celine Van Gorp

Cyrus Emil Tabery

Simon Philip Spencer Hastings

Dag Sonntag

Pierre-Yves Jerome Yvan Guittet

Christiaan Theodoor De Ruiter

Shih-Chin Liu

Wei Duan

Marcus Adrianus Van De Kerkhof

Hugo Augustinus Joseph Cramer

Karel Diederick Van Der Mast

Christian Marinus Leewis

Peter Clement Paul Vanoppen

Elliott Gerard Mc Namara

Maria Johanna Hendrika Aben

Noelle Martina Wright

Martijn Jaap Daniel Slob

Gerardo Bottiglieri

A method and associated computer program for predicting an electrical characteristic of a substrate subject to a process. The method includes determining a sensitivity of the electrical characteristic to a process characteristic, based on analysis of electrical metrology data including electrical characteristic measurements from previously processed substrates and of process metrology data including measurements of at least one parameter related to the process characteristic measured from the previously processed substrates; obtaining process metrology data related to the substrate describing the at least one parameter; and predicting the electrical characteristic of the substrate based on the sensitivity and the process metrology data.

Method to predict yield of a device manufacturing process

Diffraction models and scatterometry are used to reconstruct a model of a microscopic structure on a substrate. A plurality of candidate structures are defined, each represented by a plurality of parameters (p, p, etc.)). A plurality of model diffraction signals are calculated by simulating illumination of each of the candidate structures. The structure is reconstructed by fitting one or more of the model diffraction signals to a signal detected from the structure. In the generation of the candidate structures, a model recipe is used in which parameters are designated as either fixed or variable. Among the variable parameters, certain parameters are constrained to vary together in accordance with certain constraints, such as linear constraints. An optimized set of constraints, and therefore an optimized model recipe, is determined by reference to a user input designating one or more parameters of interest for a measurement, and by simulating the reconstruction process reconstruction. The optimized model recipe can be determined automatically by a parameter advisor process that simulates reconstruction of a set of reference structures, using a plurality of candidate model recipes. In the generation of the reference structures, restrictions can be applied to exclude unrealistic parameter combinations.

Method and apparatus for measuring a structure on a substrate, computer program products for implementing such methods and apparatus

A method defines one or more monitoring target profiles, collects and stores initial calibration data of the metrology apparatus, compiling a library of spectra that would be observed from inspection of the monitoring target profiles using the metrology apparatus calibrated according to the initial calibration data. Some operations can be performed periodically, e.g., on a daily basis: obtaining current calibration data from the apparatus, modeling the effect of the current calibration data on the metrology apparatus operation, and using the result of the modeling and the contents of the library to determine any differences between one or more values of the initial calibration data and the current calibration data, and how these changes will be translated into changes in the measurement output for a given number of stacks and geometries.

Inspection method and apparatus

In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate

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Veldhoven, Netherlands

Ruben Alvarez Sanchez