International Business Machines Corporation

Roy Arthur Carruthers

Christian Lavoie

Cyril Cabral, Jr

Ronnen Andrew Roy

James McKell Edwin Harper

Christophe Detavernier

Yun Yu Wang

Alfred Grill

Katherine Lynn Saenger

Jia Chen

Guy M Cohen

Kevin K Chan

Kirk David Peterson

Jack Oon Chu

Phaedon Avouris

Hon-Sum Philip Wong

Paul David Agnello

James M Harper

Robert J Purtell

Huiling Shang

Simon Gaudet

Jean Louise Jordan-Sweet

Sampath Purushothaman

Timothy Joseph Dalton

Kenneth Parker Rodbell

Christopher Vincent Jahnes

Gareth Geoffrey Hougham

Da-Yuan Shih

John Anthony Fitzsimmons

Steven John Koester

Jeffrey Curtis Hedrick

Sung Kwon Kang

Panayotis Constantinou Andricacos

Katherina E Babich

Chao-Kun Hu

Brian Richard Sundlof

Kamalesh K Srivastava

S Jay Chey

Lynne Marie Gignac

Donald W Henderson

Paul J Tsang

Laurent Claude Perraud

Geraldine C Schwartz

Joseph S Newbury

Fernand J Dorleans

Paul Michael Kozlowski

Gerald R Larsen

James A Jubinsky

James M E Harper

David R Di Milia

Richard P Ferlita

Richard Flitsch

Robert W Zielinski

Ebony Lynn Mays

Christopher G M M Detavernier

Paul Michael Solomon

Sandra Guy Malhotra

Kim Yang Lee

Thomas M Shaw

Stephen Mark Rossnagel

Yun-Yu Wang

Kwong Hon Wong

Anthony Gene Domenicucci

Kathryn Wilder Guarini

Robert Rosenberg

Eric Gerhard Liniger

John A Miller

Ismail C Noyan

Atul Champaklal Ajmera

John Bruley

Horatio Seymour Wildman

Ageeth Anke Bol

Stephen Bruce Brodsky

James C Tsang

Patricia A O'Neil

Christophe G M M Detavernier

Cedrik Y Cole

Cedrik Y Coia

Christopher Detavernier

A method for forming a single, few-layer, or multi-layer graphene and structure is described incorporating selecting a substrate having a buried layer of carbon underneath a metal layer, providing an ambient and providing a heat treatment to pass carbon through the metal layer to form a graphene layer on the metal layer surface or incorporating a metal-carbon layer which is heated to segregate carbon in the form of graphene to the surface or chemically reacting the metal in the metal-carbon layer with a substrate containing Si driving the carbon to the surface whereby graphene is formed.

Graphene formation utilizing solid phase carbon sources

A method for forming germano-silicide contacts atop a Ge-containing layer that is more resistant to etching than are conventional silicide contacts that are formed from a pure metal is provided. The method of the present invention includes first providing a structure which comprises a plurality of gate regions located atop a Ge-containing substrate having source/drain regions therein. After this step of the present invention, a Si-containing metal layer is formed atop the said Ge-containing substrate. In areas that are exposed, the Ge-containing substrate is in contact with the Si-containing metal layer. Annealing is then performed to form a germano-silicide compound in the regions in which the Si-containing metal layer and the Ge-containing substrate are in contact; and thereafter, any unreacted Si-containing metal layer is removed from the structure using a selective etch process. In some embodiments, an additional annealing step can follow the removal step. The method of the present invention provides a structure having a germano-silicide contact layer atop a Ge-containing substrate, wherein the germano-silicide contact layer contains more Si than the underlying Ge-containing substrate.

Self-aligned metal to form contacts to Ge containing substrates and structure formed thereby

A method that solves the increased nucleation temperature that is exhibited during the formation of cobalt disilicides in the presence of Ge atoms is provided. The reduction in silicide formation temperature is achieved by first providing a structure including a Co layer including at least Ni, as an additive element, on top of a SiGe containing substrate. Next, the structure is subjected to a self-aligned silicide process which includes a first anneal, a selective etching step and a second anneal to form a solid solution of (Co, Ni) disilicide on the SiGe containing substrate. The Co layer including at least Ni can comprise an alloy layer of Co and Ni, a stack of Ni/Co or a stack of Co/Ni. A semiconductor structure including the solid solution of (Co, Ni) disilicide on the SiGe containing substrate is also provided.

Reduction of silicide formation temperature on SiGe containing substrates

A complementary metal oxide semiconductor (CMOS) device, e.g., a field effect transistor (FET), that includes at least one one-dimensional nanostructure that is typically a carbon-based nanomaterial, as the device channel, and a metal carbide contact that is self-aligned with the gate region of the device is described. The present invention also provides a method of fabricating such a CMOS device.

Self-aligned process for nanotube/nanowire FETs

Briefly, a novel material process is disclosed wherein one or more nucleation modifiers are added, in trace amounts, to a lead-free tin-rich solder alloy to produce a solder composition with reduce or suppressed undercooling temperature characteristics. The modifier being a substance which facilitates the reduction of extreme anisotropic properties associated with body-centered-tetragonal tin based lead-free solder. The addition of the nucleation modifiers to the solder alloy does not materially effect the solder composition's melting point. As such, balls of solder with the nucleated composition freeze while other solder balls within the array remain in the melt. This effectively enables one substrate to be pinned to another substrate by one or more predetermined solder balls to secure the package while the remaining solder joints are in the liquid state. Further, the addition of a trace amount of nucleation sites within the composition facilitates control over the number, size, and orientations of primary intermetallic compounds in tin rich crystallite grains. Moreover, trace amounts of one or more solid and/or insoluble nucleating modifiers within a given volume of solder reduces the size of average crystallites within the composition.

Method and process for reducing undercooling in a lead-free tin-rich solder alloy

Briefly, a novel material process is disclosed wherein one or more nucleation modifiers are added, in trace amounts, to a lead-free tin-rich solder alloy to produce a solder composition with reduced or suppressed undercooling temperature characteristics. The modifier being a substance which facilitates the reduction of extreme anisotropic properties associated with body-centered-tetragonal tin based lead-free solder. The addition of the nucleation modifiers to the solder alloy does not materially effect the solder composition's melting point. As such, balls of solder with the nucleated composition freeze while other solder balls within the array remain in the melt. This effectively enables one substrate to be pinned to another substrate by one or more predetermined solder balls to secure the package while the remaining solder joints are in the liquid state.

A method for forming a stabilized metal silicide film, e.g., contact (source/drain or gate), that does not substantially agglomerate during subsequent thermal treatments, is provided In the present invention, ions that are capable of attaching to defects within the Si-containing layer are implanted into the Si-containing layer prior to formation of metal silicide. The implanted ions stabilize the film, because the implants were found to substantially prevent agglomeration or at least delay agglomeration to much higher temperatures than in cases in which no implants were used.

Stabilization of Ni monosilicide thin films in CMOS devices using implantation of ions before silicidation

A method for providing a low resistance non-agglomerated Ni monosilicide contact that is useful in semiconductor devices. Where the inventive method of fabricating a substantially non-agglomerated Ni alloy monosilicide comprises the steps of: forming a metal alloy layer over a portion of a Si-containing substrate, wherein said metal alloy layer comprises of Ni and one or multiple alloying additive(s), where said alloying additive is Ti, V, Ge, Cr, Zr, Nb, Mo, Hf, Ta, W, Re, Rh, Pd or Pt or mixtures thereof; annealing the metal alloy layer at a temperature to convert a portion of said metal alloy layer into a Ni alloy monosilicide layer; and removing remaining metal alloy layer not converted into Ni alloy monosilicide. The alloying additives are selected for phase stability and to retard agglomeration. The alloying additives most efficient in retarding agglomeration are most efficient in producing silicides with low sheet resistance.

Retarding agglomeration of Ni monosilicide using Ni alloys

Disclosed is a procedure to coat the free surface of Cu damascene lines by a 1-5 nm thick element prior to deposition of the inter-level dielectric or dielectric diffusion barrier layer. The coating provides protection against oxidation, increases the adhesion strength between the Cu and dielectric, and reduces interface diffusion of Cu. In addition, the thin cap layer further increases electromigration Cu lifetime and reduces the stress induced voiding. The selective elements can be directly deposited onto the Cu embedded within the under layer dielectric without causing an electric short circuit between the Cu lines. These chosen elements are based on their high negative reduction potentials with oxygen and water, and a low solubility in and formation of compounds with Cu.

On-chip Cu interconnection using 1 to 5 nm thick metal cap

A method for forming a stabilized metal silicide film, e.g., contact (source/drain or gate), that does not substantially agglomerate during subsequent thermal treatments, is provided. In the present invention, ions that are capable of attaching to defects within the Si-containing layer are implanted into the Si-containing layer prior to formation of metal silicide. The implanted ions stabilize the film, because the implants were found to substantially prevent agglomeration or at least delay agglomeration to much higher temperatures than in cases in which no implants were used.

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Stormville, NY, United States of America

Roy Arthur Carruthers