Asml Holding N.v.

Asml Netherlands B.v.

Roxana Rezvani Naraghi

Timothy A Brunner

Krishanu Shome

Earl William Ebert

Sergei Sokolov

Lambertus Gerardus Maria Kessels

Fadi El-Ghussein

Ali Alsaqqa

A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that includes a wedge system comprising a first wedge configured to diverge the second portion.

Lithographic apparatus, metrology system, and intensity imbalance measurement for error correction

A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.

Variable diffraction grating

Growing community of inventors

Easton, CT, United States of America

Roxana Rezvani Naraghi