Asml Netherlands B.v.

Rowin Meijerink

Bearrach Moest

Laurentius Johannes Adrianus Van Bokhoven

Norbertus Josephus Martinus Van Den Nieuwelaar

Pieter Gerardus Jacobus Smorenberg

Theo Wilhelmus Maria Thijssen

Putra Saputra

Paul Derwin

Khalid Elbattay

Thijs Schenkelaars

Ma Su Su Hlaing

Bo Zhong

Masaya Komatsu

A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.

Sub-field control of a lithographic process and associated apparatus

A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.

Lithographic method

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Leiden, Netherlands

Rowin Meijerink