Applied Materials, Inc.

Micronix Corporation

Ronnie Northrup

Kien Nai Chuc

Bruno Strul

Bernard Fay

Monoocher Birang

A photometer having a plurality of input fibers to its optical entrance, at least one of which is for transmission of calibration light and at least one of which is for transmission of sample light. The exit ends of these fibers are aligned into a linear array, thereby producing an effective entrance slit for the optical entrance of the photometer. The fiber(s) for calibration light are positioned at the center of the linear array to avoid miscalibration due to photometer astigmatism.

Calibration technique for monochromators and spectrophotometers

A mask for reducing a semiperiodic variation of an output signal produced in response to a semiperiodic temporal variation of a distribution of radiation incident on the input of a detector. The mask can have a transmitance that changes abruptly at an outer profile of an opaque region or can have a varation in transmittance that varies continuously.

Optical mask filter capable of reducing the semiperiodic component of

An x-ray mask membrane reflection compensator includes an x-ray chamber having a transmitting gaseous media therein chamber through which x-rays are directed to a mask membrane that is positioned in close spaced proximity to a resist-coated wafer. A controlled environment of processing gas is provided within a gap between the mask membrane and wafer surfaces. The processing gas and gaseous media pressures variously cause bulging of the membrane resulting in a descrepancy in the gap distance across the field of view. A laser source provides an incident beam of light which is directed at an incident angle to the mask membrane and the wafer surface such that return beams are reflected and interference fringe patterns, due to slight nonparallelism of the mask membrane and the wafer are displayed on a monitor. A standard reference line is established by a reference fringe band at a null position of the mask membrane and the movement of the reference fringe based from the references line is utilized to detect the deflection of the mask membrane by reason of a net differential pressure on the mask membrane. Control of the pressure of the processing gas or chamber gaseous media returns the reference fringe band pressure to the reference line to indicate that the mask membrane is back at a null, nondeflected position.

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San Jose, CA, United States of America

Ronnie Northrup