Ciba Specialty Chemicals Corporation

Basf Se Corporation

Rong Xiong

Mervin Gale Wood

Joseph Suhadolnik

Joseph E Babiarz

Ramanathan Ravichandran

Deborah DeHessa

Jacqueline Lau

Andrew B Naughton

Jerome Sanders

Stephen D Pastor

Patrice Bujard

Robert E Detlefsen

Andrew Brian Naughton

Deborah Judd

Anthony David Debellis

Walter L Renz

Andrew J Naisby

Stephen Daniel Pastor

The present invention is directed to a process for the preparation of a plane-parallel structure (a platelet-shaped body, or flake), comprising at least one dielectric layer consisting of one or more oxides of a metal selected from groups 3 to 15 of the periodic table, which comprises the steps of: (a) applying a thin film of the dielectric material on a flexible belt, by passing the belt through an aqueous solution of a fluorine scavenger and one or more fluorine containing metal complexes which are the precursors of the desired metal oxide coating; and subjecting said solution to microwave radiation to deposit the metal oxide onto said flexible belt, wherein step (a) can optionally be repeated using different fluorine containing metal complexes to produce one or more metal oxide layers or a gradient of concentration of 2 different metal oxides across the thickness; (b) separating the resulting layer from the flexible belt as plane-parallel structures.

Process of using microwave deposition of metal oxide onto an organic substrate

A process for the preparation of a plane-parallel structure (a platelet-shaped body, or flake), comprising at least one dielectric layer consisting of oxides of one or more metal selected from groups 3 to 15 of the periodic table, which method comprises subjecting one or more precursors of one or more desired metal oxides and an acidic catalyst to microwave radiation to form a metal oxide layer on a substrate; and separating the resulting metal oxide layer from the substrate.

Process for producing metal oxide flakes

The invention relates to poly(vinylalcohol)-co-poly(vinylamine) copolymers represented as formula (I), where B is greater than or equal to 1, L is independently of each other a chemical linking group which is &#x2014;NH&#x2014;, &#x2014;N&#x2550;, &#x3e;N&#x2014;, &#x3e;N+&#x3c;, &#x2014;O&#x2014; or &#x2014;CO&#x2014;, COPOLYMER is derived from a prepolymer of the formula (II) where Rand Rare independently H; 3-propionic acid or C,-Calkyl ester thereof; or is 2-methyl-3-propionic acid or C-Calkyl ester thereof, Rand Rare independently H or C,-Calkyl, x+y+z is between about 3 and about 50 mole percent and q, n and m together make up the remainder of the mole percent, the indices x, y, z, n, m -and q independently may be 0, if q is not 0, b may also be 0. 

Poly(vinylalcohol)-co-poly(vinylamine)polymers comprising functional moieties

A process for the preparation of organic material comprising an organic substrate and at least one dielectric layer consisting of one or more oxides of a metal selected from groups 3 to 15 of the periodic table, which comprises the steps of: The substrate can be optionally dissolved with solvent to yield free metal oxide or mixed metal oxides that have a plane-parallel structure.

Process for the preparation of metal oxide coated organic material by microwave deposition

The present invention relates to novel ultraviolet light absorbers of the benzoxazinone, oxanilide, benzylidene malonate, quinazoline and benzotriazole classes. The invention also relates to polymer and photographic compositions stabilized against the deleterious effects of light induced degradation which comprise the novel ultraviolet light absorbers.

Ultraviolet light absorbers

Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzoic ring, for example a trifluoromethyl group, which involves digitizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.

Processes for the preparation of benzotriazole UV absorbers

Photostable, silylated benzotriazole UV absorbers and compositions stabilized therewith

Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.

A process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, preferably a trifluoromethyl group, involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or preferably nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means.

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Dobbs Ferry, NY, United States of America

Rong Xiong