Taiwan Semiconductor Manufacturing Comp. Ltd.

Rong-Long Hung

Sheng-Tai Peng

Shih-Chung Chen

Cheng-Ping Chen

Tsung-Lung Lai

The present disclosure provides a chemical mechanical polishing system having a unitary platen. The platen includes one or more recesses within the platen to house various components for the polishing/planarization process. In one embodiment, the platen includes a first recess and a second recess. The first recess is located under the second recess. An end point detector is placed in the first recess and a detector cover may be placed in the second recess. A sealing mean is provided in a space between the end point detector and the detector cover to prevent any external or foreign materials from coming in contact with the end point detector. A fastener used for fastening the detector cover to the platen also provides addition protection to prevent foreign materials from coming in contact with components received in the recesses.

Growing community of inventors

Hsinchu, Taiwan

Rong-Long Hung