Industrial Technology Research Institute

Rong-Jer Lee

Dhei-Jhai Lin

Chein-Dhau Lee

Wen-Shin Shen

Chih-Chiang Chen

Hua-Chi Cheng

Wen-Tung Cheng

An improved method for preparing multiple-exposure photomasks having at least three levels of transmissivity is disclosed. A conventional bi-exposure photomask is first formed which contains a macroscopically exposed area, a microscopically exposed area, and a masked area on a transparent substrate. Then a diffractive-refractive light-scattering optical element is formed above the microscopically exposed area so as to provide an exposure area with an intermediate light transmissivity. In a preferred embodiment, the diffractive-refractive light-scattering optical element above the microscopically exposed area is formed by first forming a transparent positive photoresist above the bi-exposure photomask. The transparent positive photoresist is exposed to an irradiation from the bottom of the transparent substrate, and is developed. Finally, the transparent positive photoresist is heated to cause a melt-flow thereof which forms a concave optical element above the microscopically exposed area. The transmissivity of the intermediate exposure area can be adjusted by adjusting the dimensions of the microscopical openings provided therein and the distance between the microscopic openings. More than one microscopic pattern can be provided on the same substrate so as to allow two or more intermediate transmissitivities to be obtained.

Method for making photomasks having regions of different light

Disclosed herein are a high-refractive plastic lens resin consisting of a polymeric reaction product obtained by an addition reaction under heat of at least one polyisocyanate represented by the following general formula (I): ##STR1## wherein X is a hydrogen, chlorine or bromine atom or a methyl or ethyl group, Z is a hydrogen atom or a methyl group, 1.ltoreq.a.ltoreq.4, 2.ltoreq.b.ltoreq.4, and a+b.ltoreq.6, with at least one allyl group compound represented by the following general formula (II): ##STR2## wherein R.sub.1 is a phenol, hydroxyl, or amine group, in such amounts that the --NCO/--OH+--NH.sub.2 molar ratio fall within the range from 0.45 to 0.50.

High-refractivity plastic lens resin

An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.

Alkalline-solution-developable liquid photographic composition

A photosensitive composition which is suitable for free radical polymerization systems initiated by ultraviolet light, particularly useful in UV-curing coating and image transfer systems such as printing plates and photoresists. Among the above mentioned applications, systems in which the photosensitive layer has no protective film to insulate it from the air shows the greatest improvement in photosensitivity.

Growing community of inventors

Yun-Lin, Taiwan

Rong-Jer Lee