Tsinghua University

Beijing U-precision Tech Co., Ltd.

Beijing Baidu Netcom Science and Technology Co., Ltd.

Shanghai Micro Electronics Equipment Co., Ltd.

Rong Cheng

Yu Zhu

Kaiming Yang

Jinchun Hu

Ming Lei Zhang

Leijie Wang

Xin Li

Wensheng Yin

Haihua Mu

Dengfeng Xu

Ming Zhang

Weinan Ye

Zhao Liu

Li Tian

Chuxiong Hu

Li Ni Zhang

Jin Zhang

Jitao Xu

Anlin Chen

Fan Zhi

Yanpo Zhao

Huichao Qin

Feng Liu

Yu Hao

Fuzhong Yang

Muwei Zhao

Ziyan Zhong

Jiankun Hao

Jing Wang

Hao Liu

Tao Liu

Dongdong Yu

Sheng Lei

Zhaokui Cheng

Wenqian Yuan

Ziwen Guo

Shengwu Du

Sen Lu

Enyao Shang

Yuezhu Yang

Rujin Han

Chang Tian

Yujiao Fan

Siqi Gao

Yujing Song

Guofeng Ji

An exposure light beam phase measurement method for laser interference photolithography comprises: separating a measurement light from an exposure light beam and inputting light into a laser phase measurement interferometer to carry out phase measurement on the exposure light beam; inputting a reference light beam homologous with the exposure light beam into the laser phase measurement interferometer; processing the reference light beam to form an interference measurement optical signal; calculating to obtain the phase of the exposure light beam. A laser interference photolithography system using the method comprises a laser phase measurement interferometer, a controller and phase modulators, the laser phase measurement interferometer measures whether the phase of an exposure light beam drifts, the controller controls phase modulators to carry out phase modulation, to achieve locking of exposure stripe phase drift and manufacturing of a high-precision variable-period optical grating.

Exposure light beam phase measurement method in laser interference photolithography, and photolithography system

A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.

Device and method for regulating and controlling incident angle of light beam in laser interference lithography

Disclosed is a heterodyne grating interferometry system based on secondary diffraction, including a single-frequency laser, an input optical fiber, an acousto-optic modulator, a reading head, and a measurement grating, an output optical fiber, a photoelectric conversion unit and an electronic signal processing unit, wherein the single-frequency laser emits a single-frequency laser, which enters the acousto-optic modulator through the input optical fiber, and is divided into a reference light and measurement light to be input to the reading head, wherein the reading head and the measurement grating convert the reference light and measurement light into a reference interference optical signal and a measurement interference optical signal and send them to the photoelectric conversion unit through the output optical fiber and wherein the photoelectric conversion unit converts the measurement interference optical signal and the reference interference optical signal into a measurement interference electrical signal and a reference interference electrical signal.

Heterodyne grating interferometry system based on secondary diffraction

A high-resolution phase detection method and system based on a plane grating laser interferometer. The method uses a dual-frequency interferometer to measure the displacement, and the measurement signal processing comprises an integral part and a decimal portion, a phase equation set of a displacement measurement signal is constructed according to a measurement optical path principle of a heterodyne plane grating laser interferometer; a non-linear equation set for which the unknowns are instantaneous phase, interval phase and signal amplitude is established; and the equation sets above are solved by using the least squares method, so as to realize phase discrimination, thereby realizing precise displacement measurement. The method can solve the problems in the traditional time measurement-based phase detection technology, such as low measurement accuracy, and failing to satisfy small measuring range measurement. The measurement method can be applied to systems such as precision manufacturing equipment and lithography machine.

High-resolution phase detection method and system based on plane grating laser interferometer

Disclosed is a scanning interference photolithography system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform and a control subsystem, wherein a substrate is carried on the motion platform, a displacement measurement interferometer is used to measure the displacement of the motion platform, a first light beam and a second light beam are focused on the substrate for interference exposure; the control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light beam and the second light beam. The system has a high precision of fringe pattern locking and a high laser utilization rate, and can be used for producing a large-area high-precision dense grating line gradient periodic grating.

Scanning interference lithographic system

Disclosed are a vertical motion protection method and device based on a dual-stage motion system of a photolithography machine. The method comprises: according to a distance between measured points and reference points of the eddy current sensor and coordinates of the reference points of the eddy current sensor, calculating coordinates of the measured points on a lower surface of the micro-motion stage respectively; calculating a point normal form equation of the micro-motion stage at the current time using measured coordinates of the measured points on the micro-motion stage, then substituting X and Y coordinates of the measured points on the translated micro-motion stage to determine a maximum height of the micro-motion stage at the current time; and comparing the maximum height with a height threshold, if the maximum height exceeds the height threshold, shutting down for protection, or else continuing to operate the system.

Vertical motion protection method and device based on dual-stage motion system of photolithography machine

A laser interference photolithography system, comprising a laser device, a first reflector, a grating beam-splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitting prism, a control module, an angle measurement module, a third lens and a substrate. The control module comprises a signal processing terminal, a controller, and a driver. The signal processing terminal is connected to the angle measurement module, the controller is connected to both the signal processing terminal and the driver, and the driver is connected to both the first universal reflector and the second universal reflector. The laser emits a laser light that is split into two beams of light by the system, and the two beams of light are focused on the substrate for exposure.

Laser interference photolithography system

Disclosed is a plane grating calibration system, comprising an optical subsystem, a frame, first vibration isolator, a vacuum chuck, a workpiece stage, second vibration isolator, a base platform and a controller; the optical subsystem is mounted on the frame, and the frame is isolated from vibration by the first vibration isolator; the vacuum chuck is rotatably mounted on the workpiece stage, the workpiece stage is positioned on the base platform, and the base platform is isolated from vibration by the second vibration isolator. A displacement interferometer is integrated into the optical subsystem, and the entire optical subsystem adopts a method of sharing a light source, thereby avoiding the problems of low wavelength precision and poor coherence of separate light sources.

Plane grating calibration system

A five-degree-of-freedom heterodyne grating interferometry system comprises: a single-frequency laser for emitting single-frequency laser light, the single-frequency laser light can be split into a reference light beam and a measurement light beam; an interferometer lens set and a measurement grating for converting the reference light and the measurement light into a reference interference signal and a measurement interference signal; and multiple optical fiber bundles respectively receiving the measurement interference signal and the reference interference signal, wherein each optical fiber bundle has multiple multi-mode optical fibers respectively receiving interference signals at different positions on the same plane. The system is not over-sensitive to the environment, is small and light, and is easy to arrange. Six-degree-of-freedom ultra-precision measurement can be achieved by arranging multiple five-degree-of-freedom interferometry systems and using redundant information, thereby meeting the needs of a lithography machine worktable for six-degree-of-freedom position and orientation measurement.

Five-degree-of-freedom heterodyne grating interferometry system

Embodiments of the present disclosure relate to a method and apparatus for determining a text color. The method may include: determining, in response to detecting a text frame on canvas, a subimage corresponding to the text frame from the canvas; acquiring color values of pixels in the subimage, to determine an average color value of the subimage; determining an average luminance value of the subimage based on the average color value of the subimage; and determining a color of text to be inputted into the text frame based on the average luminance value of the subimage.

Method and apparatus for determining text color

A two-degree-of-freedom heterodyne grating interferometry measurement system, comprising: a single-frequency laser device for emitting a single-frequency laser, and the single-frequency laser can be split into a beam of reference light and a beam of measurement light; an interferometer mirror group and a measurement grating for forming a reference interference signal and a measurement interference signal from the reference light and the measurement light; and a receiving optical fiber for receiving the reference interference signal and the measurement interference signal, wherein a core diameter of the receiving optical fiber is smaller than a width of an interference fringe of the reference interference signal and the measurement interference signal, so that the receiving optical fiber receives a part of the reference interference signal and the measurement interference signal. The measurement system has advantages of insensitivity to grating rotation angle error, small volume, light weight, and a facilitating arrangement.

Two-degree-of-freedom heterodyne grating interferometry measurement system

Embodiments of the present disclosure presents a method and apparatus for generating a customized visualization component. A specific embodiment of the method comprises: determining, in response to receiving a creation instruction for instructing to create a customized visualization component, a visualization instance presented on a current component editing page based on the received creation instruction; determining an initial visualization component corresponding to the visualization instance and a user setting parameter set by a user for the visualization instance; and uploading a creation request for the customized visualization component to a server to enable the server to generate the customized visualization component based on the initial visualization component and the user setting parameter, the creation request including identifier information of the initial visualization component and the user setting parameter.

Method and apparatus for generating customized visualization component

Provided is a method for calibrating an error of installation of an interferometer in a multi-axis laser displacement measurement system, including: adding one or more redundant interferometers in a laser interferometer displacement measurement system; then establishing displacement calculating equations containing installation error of the laser interferometer and obtaining redundant measurement information by continuously measuring displacement information of multiple points, wherein the number of the combined displacement calculating equations is equal to the number of unknown quantities; and further solving the equation set to obtain the installation error of the interferometer. With a redundant arrangement of the laser interferometer, self-calibration of the installation error thereof can be achieved. A problem of difficulty in calibration of the installation error of the multi-axis interferometer in industrial application can be solved without assistance of other displacement sensors with higher precision.

Method for calibrating an error of installation of an interferometer in a multi-axis laser displacement measurement system

Disclosed is a magnetic-fluid momentum sphere, which is used for satellite attitude adjustment. The magnetic-fluid momentum sphere comprises stators and a spherical shell. The stators are classified into three groups, axes of the three groups of stators are orthogonal to each other, each group comprises two stators arranged symmetrically about the center of the spherical shell, and the inner surfaces of the stators are spherical surfaces. The spherical shell is formed by combining two hemispherical shells, the material of the spherical shell is a non-ferromagnetic material, the inner surfaces of the stators closely adhere to the outer surface of the spherical shell, there is no relative movement between the spherical shell and the inner surfaces of the stators, and the spherical shell is filled with magnetic fluid. The magnetic-fluid momentum sphere achieves a small size and mass, low costs, and small coupling among the axes.

Magnetic-fluid momentum sphere

A magnetic levitation reaction sphere includes a spherical-housing-shaped rotor and three groups of stators. Each group includes two stators using the sphere center of the rotor as a symcenter. Axes of the three groups are mutually orthogonal. Each stator comprises a stator core and a coil array. An air gap is reserved between an inner surface of each stator core and the outer surface of the rotor. Through grooves are radially formed in the stator cores. The coil arrays are disc-type motor stator windings. Two effective sides of each coil in each coil array are respectively placed in two through grooves of the corresponding stator core. The magnetic levitation reaction sphere has low cost; levitation and rotation driving are integrated; the magnetic levitation reaction sphere has a simple and compact structure, a small size and a low mass, and relates to inherent stable levitation; and the levitation control is simple.

Magnetic levitation reaction sphere

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Beijing, China

Rong Cheng