International Business Machines Corporation

Other

National University of Singapore

Advanced Technology Materials, Inc.

Shipley Company, L.l.c. of Marlborough

Ronald Wayne Nunes

Mahmoud M Khojasteh

Ali Afzali-Ardakani

George Gabriel Totir

Peter M Fryer

Gareth Geoffrey Hougham

Jeffrey Donald Gelorme

Mary Beth Rothwell

Edward D Babich

Jurij R Paraszczak

Tricia Lynn Breen

Siegfried Lutz Maurer

Sharon L Nunes

Charanjit Singh Bhatia

Russell J Serino

Koashal Kishor Mani Pandey

Nikita Gaur

Wu-Song S Huang

Minhua Lu

Emanuel Israel Cooper

Steven Alan Cordes

Hiroki Nakano

Shawn Anthony Hall

Roger F Sinta

James Patrick Doyle

Ahmad D Katnani

Soichi Nadahara

Laura Louise Kosbar

George W Orsula

Matthew J Farinelli

William R Brunsvold

Matthias Ilg

Richard L Kleinhenz

Radhika Srinivasan

Thomas John Licata

James Vichiconti

Mary Elizabeth Rothwell

Motoya Okazaki

Michael Patrick Mastro

George Liang-Tai Chiu

William Joseph Surovic

Istvan Lovas

Uday Kumar

Shigeki Sugimoto

Klaus Roithner

Klaus Penner

Robert Scott Emmans

Robert H Fair

James I Fahey

A magnetic data storage medium includes an ion doped magnetic recording layer having a continuous grading of coercivity or anisotropy. The medium also includes an ion-doped overcoat having an ion density that is at a maximum substantially at the interface with the recording layer and has a continuous grading of ion density between the overcoat and the recording layer. The coercivity is at a minimum substantially at the interface.

Method of fabricating graded media

A magnetic data storage medium comprising: an ion doped magnetic recording layer having a continuous grading of coercivity or anisotropy, wherein the coercivity or anisotropy is at a minimum substantially at one side of the magnetic recording layer, and having substantial portion of maximum coercivity or anisotropy at the other side of the magnetic recording layer. Also, a method of fabricating a magnetic data storage medium is included.

A spin-on formulation that is useful in stripping an ion implanted photoresist is provided that includes an aqueous solution of a water soluble polymer containing at least one acidic functional group, and at least one lanthanide metal-containing oxidant. The spin-on formulation is applied to an ion implanted photoresist and baked to form a modified photoresist. The modified photoresist is soluble in aqueous, acid or organic solvents. As such one of the aforementioned solvents can be used to completely strip the ion implanted photoresist as well as any photoresist residue that may be present. A rinse step can follow the stripping of the modified photoresist.

Spin-on formulation and method for stripping an ion implanted photoresist

Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cerium. The cerium may be comprised in a salt. The salt may be cerium ammonium nitrate.

Removal of masking material

In a liquid crystal display device, a method for creating desirable pretilt angle by means of topography of the substrates, such as a surface that is sloped with respect to the surface of the electrodes. In combination with a low pretilt but highly photo-stable alignment layer, which may be very resistant to high levels of ultraviolet radiation, a high pretilt and photo-stable alignment structure is generated, by essentially combining two incompatible technical approaches. The ever more stringent requirements for projection displays are met. The methods for producing such sloped surfaces and the considerations related to design of the sloped surfaces are disclosed.

Method of producing UV stable liquid crystal alignment

A process of making a microcontact printing stamp useful in the microcontact printing of a microcircuit. In this process an elastomeric microcontact printing stamp is formed by curing a degassed liquid elastomeric monomer or oligomer, optionally saturated with helium, a mixture of helium and an inert gas or a mixture of hydrogen and an inert gas, in a mold in which a photoresist master, defining a microcircuit in negative relief, is predisposed above a backplane.

Process of fabricating a precision microcontact printing stamp

Method and apparatus for accurate, micro-contact printing

A process of making a high precision microcontact printing stamp in which an elastomeric monomer or oligomer is introduced into a mold wherein a photoresist master imprinted with a microcircuit design in negative relief is predisposed. The monomer or oligomer is cured at a temperature no higher than about ambient temperature whereby a distortion-free microcontact printing stamp having the microcircuit design of the photoresist master in positive relief is formed.

A method of exposing a composite organic/inorganic master to alkylchlorosilanes in the vapor phase. Chlorosilanes participate in facile reactions with hydroxyl groups existing on the surface of inorganic oxides (such as glass or the native oxides on silicon, aluminum, tin, etc.); or those in organics-containing phenolic or alcoholic groups, such as photoresists. The alkyl group on the silane can be chosen from a large selection of aliphatic or aromatic organic groups that have substituents with varying polarity and reactivity.

Vapor phase surface modification of composite substrates to form a molecularly thin release layer

A process of making a microcontact printing stamp useful in microcontact printing of microcircuits. In this process an elastomeric microcontact printing stamp is formed by curing an elastomeric monomer or oligomer in a mold in which a photoresist master, defining a microcircuit in negative relief, is predisposed above a flat and rigid backplane laminate. The flat and rigid plane member of the backplane laminate is delaminated from the backplane after the printing stamp is removed from the mold.

Microcontact printing to pattern a self-assembled monolayer (SAM) of an alkanephosphonic acid on a film of indium zinc oxide (IZO). The SAM is robust enough to protect the undelying IZO from wet chemical etching, and thus defines a pattern of IZO on the substrate. In the microcontact printing process, a patterned, elastomeric stamp is inked with a solution of octadecylphosphonic acid and brought into conformal contact with the IZO surface. A SAM of alkanesulfonic acid forms where the stamp and the surface make contact; the rest remains underivatized. The stamp is then removed from the surface. Etching the sample in aqueous oxalic acid removes the unprotected areas, while the areas protected by the SAM remain in place.

Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof

Fabrication of trench capacitors using disposable hard mask

Methods are provided to prepare photoresists without isolation of various components, i.e. in a 'one-pot' procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.

Methods for preparing photoresist compositions

Growing community of inventors

Hopewell Junction, NY, United States of America

Ronald Wayne Nunes