Eastman-kodak Company

Ronald W Wake

Gilbert Allan Hawkins

David L Losee

Robert Leroy Nielsen

Sibylle L Reithel

Hugh G McGuckin

R Daniel McGrath

An image sensor includes a plurality of photosensitive sites; a plurality of asymmetrical-shaped microlenses positioned spanning the photosensitive sites; wherein incoming light is directed in a predetermined direction by an asymmetrical surface of the asymmetrical-shaped microlenses onto the photosensitive sites for capturing the light in a substantially uniform manner.

Asymmetrical microlenses on pixel arrays

A method of making a solid state image sensor having a color filter array with color filter elements having a plurality of different types of colored pixels embedded in a planar surface, the method includes providing a first transparent layer covering the pixels; making the first transparent layer optically planar by chemical mechanical polishing; and uniformly depositing a second transparent etch-stop layer over the first transparent layer. The method further includes uniformly depositing a third support layer over the second transparent etch-stop layer which is made of a different material than the second transparent etch-stop layer; etching openings into the third support layer in regions where color filter elements are desired to be formed; conformably coating a photoresist layer in the openings on the top surface of the second transparent etch-stop layer and on the top surface of the third support layer; patterning the photoresist layer to remove portions of the photoresist layer corresponding to the first type of colored pixels; coating the photoresist layer and the second transparent etch-stop layer in the patterned opening portions with color filter material of the first color type corresponding to the first type of colored pixels; removing the first type of color filter material from positions where it was coated over the photoresist layer.

Method of making planar image sensor color filter arrays

An image sensor and method of making such sensor is described. The sensor includes an integral color filter array, comprising: a semiconductor substrate having an optically planar top surface; a plurality of spaced image pixels formed in the substrate; and an array of physically contiguous color filter elements embedded in the substrate whose top and bottom surfaces are coplanar and which have no overlap of color filter layers between adjacent color filter elements.

Planar color filter array for CCDs with embedded color filter elements

For use in forming a high resolution color filter array the following steps are used: coating a colored layer containing a binder, a colorant in the binder, the binder being transparent over the entire visible electromagnetic spectrum and remaining so even after extended treatment with elevated temperature and light; hardening the colored layer; providing and patterning a photoresist layer over the hardened colored layer; and treating the patterned photoresist layer so that it is selectively resistant to oxygen plasma etch. Further processing steps are used to complete the colored filter array.

Method of forming a color filter array with improved resolution

Method for making planar color filter array for image sensors with

A color filter array is made by a method which uses a dye solution having a charge opposite to that of a mordant and an ionic component of the same charge as the dye solution.

Color filter arrays with optimum dye density

A color filter array suitable for use in an image sensor is formed with a first layer having a mordant of one polarity and a first dye of the opposite polarity, and a second layer having a second mordant of a polarity opposite to the first mordant and a second dye of a polarity opposite to the second mordant.

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Hilton, NY, United States of America

Ronald W Wake