Saint-gobain Ceramics & Plastics, Inc.

Other

Norton Company

Saint-gobain/norton Industrial Ceramics Corporation

Saint-gobain Industrial Ceramics, Inc.

Saint-gobain Cermaics & Plastics, Inc.

Ronald W Laconto

Andrew G Haerle

Douglas Edwin Ward

Jun Wang

Rami Schlair

Gwo Shin Swei

Thomas G Kinisky

Dean B Arvidson, Jr

Douglas E Ward

A method for chemical mechanical polishing of a substrate includes polishing the substrate at a stock removal rate of greater than about 2.5 &#x212b;/min to achieve a Ra of not greater than about 5.0 &#x212b;. The substrate can be a III-V substrate or a SiC substrate. The polishing utilizes a chemical mechanical polishing slurry comprising ultra-dispersed diamonds and at least 80 wt % water.

Chemical mechanical planarization using nanodiamond

A method of machining a workpiece includes applying a fluid between a fixed abrasive component and a workpiece, followed by translation of the fixed abrasive component and the workpiece relative to each other. The fluid contains an anti-clogging agent containing a phosphorus-containing organic chemistry.

Methods for machining inorganic, non-metallic workpieces

A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2:1.

Polishing slurries

A method for machining a ceramic substrate containing Al, including providing a solution containing a phosphorus compound on the ceramic substrate; and machining the substrate with an abrasive.

Methods for machine ceramics

A method for machining a ceramic substrate containing Al, including providing a slurry between a substrate and a machine tool, the slurry containing alumina abrasive and an additive including a phosphorus compound, and moving the substrate relative to the machine tool.

Methods for machining ceramics

An optical polishing tool comprises alpha alumina and ceria components in relative weight proportions of from 30:70 to 70:30 dispersed in a resin binder. Particularly preferred are coated abrasives. Such coated abrasives produce an improved optical polishing performance.

Fixed abrasives for optical polishing

An optical polishing slurry with alumina and ceria components is found to produce an improved polishing performance over either component used alone.

Optical polishing formulation

This invention relates to polishing YTZP zirconia disk substrates with colloidal silica to achieve a surface roughness Ra of no more than 8 angstroms.

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Leicester, MA, United States of America

Ronald W Laconto