Asml Netherlands B.v.

Ronald Van Ittersum

Jochem Sebastiaan Wildenberg

Roy Werkman

Hermanus Adrianus Dillen

Hadi Yagubizade

Xiuhong Wei

Bijoy Rajasekharan

Lydia Marianna Vergaij-Huizer

Pieter Gerardus Jacobus Smorenberg

Robertus Wilhelmus Van Der Heijden

Koen Thuijs

Willem Louis Van Mierlo

Fan Feng

A method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method includes obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on the probability and at least a second control objective having a second probability of being achievable compared to the first control objective.

Method for controlling a manufacturing process and associated apparatuses

A method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method including: determining the plurality of corrections including a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer, wherein the determining includes determining corrections for each layer simultaneously in terms of a matching parameter.

Method for controlling a manufacturing apparatus and associated apparatuses

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Tilburg, Netherlands

Ronald Van Ittersum