Asml Netherlands B.v.

Ronald Van Der Ham

Koen Steffens

Wilhelmus Franciscus Johannes Simons

Gerben Pieterse

Paulus Martinus Maria Liebregts

Han Henricus Aldegonda Lempens

Gert-Jan Gerardus Johannes Thomas Brands

Cornelius Maria Rops

Gregory Martin Mason Corcoran

Michel Riepen

Franciscus Johannes Joseph Janssen

Tjarko Adriaan Rudolf Van Empel

Ruud Hendrikus Martinus Johannes Bloks

Niek Jacobus Johannes Roset

Theodorus Wilhelmus Polet

Marcio Alexandre Cano Miranda

Paul Petrus Joannes Berkvens

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Joris Johan Anne-Marie Verstraete

Johannes Henricus Wilhelmus Jacobs

Thibault Simon Mathieu Laurent

Erik Henricus Egidius Catharina Eummelen

Ivo Adam Johannes Thomas

Daniel Jozef Maria Direcks

Pieter Lein Joseph Gunter

Mathieus Anna Karel Van Lierop

Coen Cornelis Wilhelmus Verspaget

Daniël Jozef Maria Direcks

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Johan Gertrudis Cornelis Kunnen

Frank Johannes Jacobus Van Boxtel

Martijn Houben

Sander Catharina Reinier Derks

Eva Mondt

Marinus Jan Remie

Francis Fahrni

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Sergei Shulepov

Theodorus Marinus Modderman

Marcel Beckers

Herman Vogel

Giovanni Luca Gattobigio

Marco Baragona

David Bessems

Jimmy Matheus Wilhelmus Van De Winkel

Ruud Olieslagers

Antonius Johannes Van Der Net

Hubert Marie Segers

Bart Smeets

Victor Manuel Blanco Carballo

Aart Adrianus Van Beuzekom

Jozef Augustinus Maria Alberti

Willem Jan Bouman

Pepijn Van Den Eijnden

Paul Van Dongen

Walter Theodorus Matheus Stals

Frederik Antonius Van Der Zanden

Bas Willems

Wilhelmus Antonius Wernaart

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Jeroen Johannes Sophia Maria Mertens

Martinus Hendrikus Antonius Leenders

Joeri Lof

Engelbertus Antonius Fransiscus Van Der Pasch

Roelof Frederik De Graaf

Bernardus Antonius Johannes Luttikhuis

Willem Jurrianus Venema

Lucas Henricus Johannes Stevens

Richard Moerman

Johannes Christiaan Maria Jasper

Danny Maria Hubertus Philips

Marinus Johannes Maria Van Dam

Pieter Mulder

Ronald Johannes Hultermans

Hrishikesh Patel

Nicolas Alban Lallemant

Paul William Scholtes-Van Eijk

Jacob Marinus Jan Den Toonder

Jan Willem Cromwijk

Menno Fien

Marcus Johannes Van Der Zanden

Nicolaas Franciscus Koppelaars

Matheus Anna Karel Van Lierop

Johanna Antoinette Maria Sondag-Huethorst

Robertus Leonardus Maria In 't Groen

Pieter Debrauwer

Antonius Arnoldus Henricus Van Der Steen

Milica Kovacevic-Milivojevic

Ralph Theodorus Hubertus Maessen

Gert-Jan Geradus Johannes Thomas Brands

Jan-Marius Schotsman

Johannes Antonius Maria Martina Van Uijtregt

A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

Fluid handling system and lithographic apparatus

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure COgas so as to provide a substantially pure COgas environment adjacent to, and radially outward of, the space.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Lithographic apparatus and a method of manufacturing a lithographic apparatus

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

Lithographic apparatus and a device manufacturing method

An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

Immersion lithographic apparatus and device manufacturing method

A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

Growing community of inventors

Maarheeze, Netherlands

Ronald Van Der Ham