Asml Netherlands B.v.

Ronald Stultiens

Martinus Cornelis Maria Verhagen

Marcel Beckers

Nicolas Alban Lallemant

Pascal Antonius Smits

David Theodorus Willy Van Der Plas

Stephan Koelink

Henk Krus

Wladimir Fransiscus Gerardus Maria Hertog

Wladimir Franciscus Gerardus Maria Hertog

A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Veghel, Netherlands

Ronald Stultiens