Average Co-Inventor Count = 7.39
ph-index = 7
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Kla-tencor Technologies Corporation (9 from 641 patents)
2. Western Digital (fremont), Inc. (3 from 728 patents)
3. Ventana Medical Systems, Inc. (1 from 514 patents)
13 patents:
1. 9001629 - Systems and methods for suppressing background energy of a waveguide in an energy assisted magnetic recording system
2. 8958168 - Method and system for providing an NFT having improved mechanical stability
3. 8831767 - Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
4. 8670294 - Systems and methods for increasing media absorption efficiency using interferometric waveguides
5. 8625930 - Digital microscope slide scanning system and methods
6. 8010222 - Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
7. 7332438 - Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
8. 7175503 - Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device
9. 7052369 - Methods and systems for detecting a presence of blobs on a specimen during a polishing process
10. 7030018 - Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
11. 6935922 - Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing
12. 6884146 - Systems and methods for characterizing a polishing process
13. 6866559 - Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing pad