Hewlett-packard Company

Other

Ronald Hiskes

Christopher A Schantz

Stephen A DiCarolis

Martha L Narbut

Rene P Helbing

Eric G Hanson

Robert A Burmeister

Paul E Greene

A method for depositing a thin film including a sulfide of a metal on a substrate. First and second vapor streams are generated and combined in the vicinity of the substrate. The first vapor stream includes an organic compound containing the metal is generated. The second vapor stream includes a mercaptan. The preferred mercaptan is tertrary-butyl-mercaptan. The preferred metal precursor is a .beta.-diketonate of the metal.

Growth of electroluminescent phosphors by MOCVD

A system for MOCVD fabrication of superconducting oxide thin films provides a feed tube having a narrow slot along its length with a uniform mixture of powdered precursor materials packed inside the tube. The mixture composition is such that the resulting film has the desired stoichiometry. The tube moves downward at a controlled rate past a bank of heating lamps surrounded by a heat reflector. At each position of the tube this structure heats a localized section of the precursor material, with a sharp temperature gradient at the boundary of the section so that the heating is confined to this section. The precursor material in the heated section is substantially completely vaporized, with negligible decomposition and nonvolatile residue formation, and the vaporization rate is governed by the downward velocity of the tube. The vaporized material escapes through the longitudinal slot, and is swept by a carrier gas into a reaction zone. Oxygen is mixed with the gas stream, and the reaction products are deposited as a thin film on the substrate. A modification of this system includes coils adjacent to the reaction zone, connected to an rf generator. These coils produce a plasma in the reagent gas mixture that enhances the chemical reaction.

MOCVD system for forming superconducting thin films

A method and apparatus are disclosed for chemically vapor depositing a thin film of an oxide based superconductor on a substrate, which is preferably a substrate comprising superconducting material. Gaseous forms of the respective reactants are first formed and then reacted together in a reaction zone adjacent a spinning substrate. In a preferred embodiment, the reactants are exposed to UV light during the reaction to catalyze the reaction.

Chemical vapor phase method for forming thin films of high temperature

A method is disclosed for forming a thin film of an oxide based superconductor on a substrate, which is preferably a substrate comprising superconducting material, which comprises forming an oxide based solvent, dissolving in the solvent a stoichiometric amount of compounds capable of forming a superconducting material to form a molten solution, maintaining the molten solution at a temperature of from about 400.degree. to about 1000.degree. C., immersing a substrate into the resulting molten solution, epitaxially growing a thin film of a superconductor crystal on the substrate, and bubbling a source of oxygen through the molten solution during the epitaxial growth of the thin film superconductor crystal.

Liquid phase epitaxial method for forming single crystal films of high

A CVD furnace, having a gas seal and a liquid seal, for chemical vapor deposition of a coating on a fiber. A CVD process utilizing the CVD furnace allows fibers to be pulled through the furnace without drawing gases entrained by the moving fiber into the reaction chamber of the furnace. The process is a hot fiber process, preferably deriving its heat from the meltdown point in an optical fiber pulling process. A coat containing carbon is applied by supplying a reactant containing a carbon having a triple bond. A small amount of silane is also supplied to the reaction chamber to act as an oxygen getter and to prevent tar-like reaction products from clogging the furnace.

High speed chemical vapor deposition process utilizing a reactor having

A coating is applied to an optical fiber to form a thin hermetic seal. The coating is preferably applied on-line by a process such as chemical vapor deposition. The coating retains its integrity under extreme conditions of temperature and pressure thereby expanding the range of uses of optical fibers.

Optical fiber with hermetic seal and method for making same

An optical fiber is coated with an inorganic non-metallic coating to form a thin seal. The coating is preferably applied on-line by a process such as chemical vapor deposition.

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Palo Alto, CA, United States of America

Ronald Hiskes