Ada-Es, Inc.

Ronald Hanson

Cameron E Martin

Robert Wayne Wewer

Randall J Boerema

Nicole M McCann

Tyler J Derritt

A contaminated gas stream can be passed through an in-line mixing device, positioned in a duct containing the contaminated gas stream, to form a turbulent contaminated gas stream. One or more of the following is true: (a) a width of the in-line mixing device is no more than about 75% of a width of the duct at the position of the in-line mixing device; (b) a height of the in-line mixing device is no more than about 75% of a height of the duct at the position of the in-line mixing device; and (c) a cross-sectional area of the mixing device normal to a direction of gas flow is no more than about 75% of a cross-sectional area of the duct at the position of the in-line mixing device. An additive can be introduced into the contaminated gas stream to cause the removal of the contaminant by a particulate control device.

Low pressure drop static mixing system

The present disclosure is directed to a dense-phase additive transportation system for additive injection into a contaminated gas stream.

Growing community of inventors

Littleton, CO, United States of America

Ronald Hanson