Asml Netherlands B.v.

Ronald Frank Kox

Erik Henricus Egidius Catharina Eummelen

Jorge Alberto Vieyra Salas

Giovanni Luca Gattobigio

Yuri Johannes Gabriël Van De Vijver

Norbertus Josephus Martinus Van Den Nieuwelaar

Bert Dirk Scholten

Victor Manuel Blanco Carballo

Pieter Lein Joseph Gunter

Frederik Antonius Van Der Zanden

Marijn Wouters

David Merritt Phillips

Casper Roderik De Groot

Rolf Hendrikus Jacobus Custers

Pieter Jeroen Johan Emanuel Hoefnagels

Cornelius Maria Rops

Ruud Hendrikus Martinus Johannes Bloks

Theodorus Wilhelmus Polet

Johannes Cornelis Paulus Melman

Johan Franciscus Maria Beckers

Marcus Johannes Van Der Zanden

John Maria Bombeeck

Patricius Jacobus Neefs

Nirupam Banerjee

Rik Vangheluwe

Mike Paulus Johannes Van Gils

Maarten Marinus Van Oene

Wouterus Jozephus Johannes Van Sluisveld

A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.

Device manufacturing method and computer program

A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus

A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.

Lithography apparatus and a method of manufacturing a device

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

Lithography apparatus and method of manufacturing a device

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Peer, Belgium

Ronald Frank Kox