Tamarack Scientific Co. Inc.

Other

Tamarac Scientific Co., Inc.

Ronald E Sheets

John R Bjorkman

Howard W Doering, Jr

George A Barbas

James C Fletcher

Robert G Heitel

Yanrong Yuan

The present invention involves both an apparatus and a method for handling and holding panels and other substrates for photolithographic exposures. In one of its aspects, the present invention comprises bi-modal vacuum cup-bellows devices which automatically retract behind (below) the surface of a chuck, and to remain so retracted at all times except when it is desired to draw a panel toward the chuck. The retraction eliminates interference with movements of the panel during snubbing. In another of its aspects, the present invention comprises registration (locator) pin mechanisms that incorporate bearings. The bearings both turn and move axially, and operate to prevent the panel edges from hanging thereon. In another of its aspects, the present invention comprises a hand-off vacuum cup-bellows device that clamps onto each panel as it comes from a robotic loader. Such device incorporates a lubricious cover that prevents rolling of the cup edges and that facilitates sliding of each panel during snubbing. The devices are such as not to prevent vacuum gripping of the rear surface of the panel. In another of its aspects, the present invention comprises a snubber cylinder and bar that applies light pressure along a substantial length of the thin edge of each panel, and that is constructed to reduce the chances that a panel edge will hang up on the bar.

Apparatus and method for automatically handling and holding panels near

A Dyson lens system includes a radiation source, a concave mirror, and a plano-convex lens. There is also incorporated in the system an additional lens that is spaced from the plano-convex lens a large part of the distance from the plano-convex lens to the mirror. A roof prism and a turning prism are provided to conduct radiation from the radiation source to the plano-convex lens and also from the plano-convex lens to an image plane. An image adjustor or compensator is provided between the prisms and either the image plane or an object plane--the latter being disposed between the radiation source and the prisms. An adjustment mechanism is provided to effect highly accurate adjustment of the location of the image, the adjustment mechanism including physical shifting to a slight degree of a portion of one or both prisms.

Unit magnification projection system and method

Scanning microlithography apparatus for effecting exposures of substrates to radiation sources. A mask support and a substrate stage are disposed in spaced-apart positions directly opposite each other, witch a lens system between them and with a radiation source on the outer side of the mask support. The mask support and substrate stage are at a substantial angle to horizontal in order to achieve benefits including reduction in gravitation-induced sagging of the mask. A massive block of granite is provided at the substantial angle to horizontal, and has a flat face that keeps the mask support and substrate stage at desired positions relative to the radiation source and lens system, during scanning.

Large-area projection exposure system

The angles of the walls of vias being ablated by excimer lasers are controlled by interposing refractive elements between the masks and the workpieces, and rotating the refractive elements about axes parallel to the optical axis. In one embodiment, the refractive element has parallel faces, and is inclined. In another embodiment, the faces of the refractive element are at a small angle to each other.

Method and apparatus for effecting selective ablation of a coating from

In accordance with the method, an integrating kaleidoscope and lamps combine to cause heating of a semiconductor wafer to achieve desired effects such as annealing, etc. In one form of the method, the heating of the wafer is such as to achieve rapid annealing by isothermal heating alone. In another form of the method the heating is such as to effect isothermal heating immediately followed by thermal flux heating.

Method of heating semiconductor wafers in order to achieve annealing,

An integrating light pipe, very preferably a kaleidoscope, encloses a source of radiant thermal energy, the light pipe and energy source being so arranged as to achieve efficient and substantially uniform heating of a workpiece in a target plane. The pipe has closed ends so as to heat the workpiece from both sides uniformly and efficiently. The apparatus employs CW lamps, pulsed lamps, and a combination of the two.

Apparatus for heating semiconductor wafers in order to achieve

An automatic system for exposing and handling double-sided printed circuit boards without scuffing either side, which effects precise positioning of the circuit boards at exposure stations, and which holds the circuit boards firmly clamped on a planar stage during exposure. The system includes a first apparatus to expose one side of each circuit board, and a second apparatus to expose the other side thereof. Air-bearing and mechanical-engagement means cooperate with each other to float and actuate the circuit boards from one station to the other, and coarse and fine positioning means are provided at each station to effect accurate locating of the boards thereat followed by vacuum clamping onto the exposure stage. Means are provided for automatically inverting each board as it moves from the first exposure station to the second, the inverting means incorporating air-bearing and mechanical-actuating means to insure that there is no scuffing at the inverting station.

Automatic system for exposing and handling double-sided printed circuit

In an apparatus and method for effecting automatic handling of circuit boards prior to exposing them, pins are provided that effect highly accurate location of the circuit board at an exposure station. The pins are extended through slots provided in the circuit board, at least one slot being perpendicular to the others. Each pin is noncircular, being sufficiently small to be inserted through an associated slot when the pin is in one rotated position, but being sufficiently large that rotation of the pin about its axis will cause it to bind with the walls of the slot, so that further pin rotation is prevented. The pins are inserted into the slots when in the non-binding rotated positions, following which the pins are rotated so as to bind with the slot walls, and thereby move the board to a precisely known position relative to the axes of the pins. Thereafter, exposure of the board is effected.

Automatic apparatus and method for exposing, registering, and handling

Wide field illuminator

A process is disclosed for exposing to ultraviolet light a semi-conductor or hybrid substrate coated with photo-resist, in back of a mask having bars and very narrow slits, the diffraction patterns ordinarily experienced at the substrate being virtually eliminated through use, between the light source and the mask, of a light integrator comprised of two successive matrixes of very small lenses or lenticules. The lenticules form a large number of magnified, superimposed, slightly displaced images of the light source in the plane of the substrate; and when the slitted mask is interposed, this light forms a large number of diffraction patterns on the substrate which, because of their large number, superimposition, and slight displacement, results in extreme uniformity of light intensity and sharp resolution throughout the pattern of light on the substrate. A variable aperture is used in connection with the light integrator, and controls the half-angle of collimation by a collimator lens placed between the light integrator and the mask. Means are also provided for modifying the aperture pattern of this aperture plate changing it, for example, to one or more off-axis sub-apertures. A field lens is also used to improve superimposition of the lenticule images on the target.

Optical microcircuit printing process

There is disclosed a vacuum contact printer and process for printing copy plates from master photomask plates depicting electronic circuitry. The printer embodies a vacuum-tight enclosure or casing, containing three vacuum chambers, two outside master and copy plate plenum chambers, and an intermediate main chamber. Retainers for the master and copy chambers hold and frame the master photomask and copy plates, respectively, and these retainers are mounted in confronting printing frames. The one of these printing frames which supports the master photomask plate is carried by a mounting plate fixed to an outside casing, and the other of the printing frames is carried by a swinging door of this casing. The master and copy photomask plates form partitions across the interior of the casing, and are positioned against flexible elastomeric framing seals, which complete these partitions. The photomask plates and their seals thus form two outside plenum chambers and one intermediate plenum chamber, and can be evacuated, and re-pressurized, in various ways to cause the two photomask plates, which are normally in contact, to separate by a small distance, such as 0.040 inch, or to softly contact one another, or do so under substantial pressure, for contact printing.

Vacuum contact printing system and process for electronic circuit

A method and apparatus for measuring the absorptivity of a radiation detector by making the detector an integral part of a cavity radiometer. By substituting the detector for the surface of the cavity upon which the radiation first impinges a comparison is made between the quantity of radiation incident upon the detector and the quantity reflected from the detector. The difference between the two is a measurement of the amount of radiation absorbed by the detector.

Detector absorptivity measuring method and apparatus

A system is disclosed for exposing to ultraviolet light a semi-conductor or hybrid substrate coated with photo-resist, in back of a mask having bars and very narrow slits, the diffraction patterns ordinarily experienced at the substrate being virtually eliminated through use, between the light source and the mask, of a light integrator comprised of two successive matrixes of very small lenses or lenticules. The lenticules form a large number of magnified, superimposed, slightly displaced images of the light source in the plane of the substrate; and when the slitted mask is interposed, this light forms a large number of diffraction patterns on the substrate which, because of their large number, superimposition, and slight displacement, results in extreme uniformity of light intensity and sharp resolution throughout the pattern of light on the substrate. A variable aperture is used in connection with the light integrator, and controls the half-angle of collimation by a collimator lens placed between the light integrator and the mask. Means are also provided for modifying the aperture pattern of this aperture plate changing it, for example, to one or more off-axis sub-apertures. a field lens is also used to improve superimposition of the lenticule images on the target.

Growing community of inventors

Santa Ana, CA, United States of America

Ronald E Sheets