Molecular Imprints, Inc.

University of Texas System

Other

Canon Nanotechnologies, Inc.

Ronald D Voisin

Sidlgata V Sreenivasan

Michael P C Watts

Norman E Schumaker

Mario Johannes Meissl

Byung Jin Choi

Byung-Jin Choi

Daniel Babbs

Ian Matthew McMackin

Nicholas A Stacey

Frank Y Xu

Pankaj B Lad

Van Nguyen Truskett

Hillman Bailey

Duane J Voth

Mathew P C Watts

Gerard M Schmid

C Grant Willson

Douglas J Resnick

Roger Bonnecaze

Lawrence J Myron

Michael PC Watts

Ian M Mcmackin

Hillman L Bailey

Downstream expansion cylinders are associated with a combustion cylinder such that an overall surface area and displacement volume of the expansion cylinder is sufficient to lower the temperature of fluids associated with the combined engine to such an extent that a radiator can be eliminated in an associated vehicle, or other system. In a separate feature, a catalytic material is placed on surfaces which will 'see' the hot exhaust gases such that catalytic conversion of impurities in the gases can be achieved within the engine itself. In yet another feature, water is recovered from a system having both a water injection expansion cylinder, and a combustion cylinder, and the recovered water is re-used for the expansion. In yet another feature, gearing is provided between the expansion cylinder and a combustion cylinder such that the output of the combined engine is optimized, and the two cylinders do not drive the crankshafts in a one-to-one fashion. In another feature the combustion cylinder's ignition timing is delayed (retarded) to manage thermal control of said combustion cylinder between it and a subsequent expansion cylinder or cylinders.

Powering an internal combustion engine

Sets of lithographic templates providing improved lithographic alignment are described. The sets include at least two templates. The first template has an array of first geometries and the second template has an array of second geometries. The second geometries correspond to the first geometries and at least one second geometry is intentionally offset from its corresponding first geometry.

Imprint alignment method, system and template

The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

Step and repeat imprint lithography process

The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted to a fluid chamber having an inlet and a throughway. The template may be connected to the throughway and the inlet is connected to a fluid source.

Conforming template for patterning liquids disposed on substrates

Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.

Step and repeat imprint lithography processes

An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where the intentional offset may vary in magnitude and direction from one subfield to the next. The system includes an imprint lithographic machine and first and second lithography templates where the templates are adapted to enable the machine to form first and second features, respectively, and where a second feature is configured to be deliberately offset from a corresponding first feature. The template set includes at least two templates, one having features which are deliberately offset from corresponding features of another template. Also, a method of manufacturing such a template set.

Imprint alignment method, system, and template

The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.

The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.

A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing 'higher' structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.

Self-aligned process for fabricating imprint templates containing variously etched features

The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.

Method of creating a turbulent flow of fluid between a mold and a substrate

The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.

Formation of conductive templates employing indium tin oxide

A method of forming a lithographic template having an elastomer layer positioned between a body and an imprinting layer, the imprinting layer having a pattern formed thereon.

Method of forming a compliant template for UV imprinting

The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.

System for creating a turbulent flow of fluid between a mold and a substrate

The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

Growing community of inventors

Fremont, CA, United States of America

Ronald D Voisin