Asml Netherlands B.v.

Ronald Cornelis Gerardus Gijzen

Christiaan Alexander Hoogendam

Frits Van Der Meulen

Martinus Agnes Willem Cuijpers

Hendrikus Herman Marie Cox

Patrick Willem Paul Limpens

Bart Friso Riedstra

Raymond Wilhelmus Louis Lafarre

Harmen Klaas Van Der Schoot

David Ferdinand Vles

Adrianus Hendrik Koevoets

Gosse Charles De Vries

Sander Catharina Reinier Derks

Jim Vincent Overkamp

Koos Van Berkel

Christiaan Louis Valentin

Jacobus Cornelis Gerardus Van Der Sanden

Stan Henricus Van Der Meulen

Alain Louis Claude Leroux

Dries Vaast Paul Hemschoote

Erik Johan Arlemark

Joost De Hoogh

Paul Comé Henri De Wit

Evert Auke Rinze Westerhuis

Maikel Cornelis Andreas Bruin

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

The invention pertains to a stage system, and to a lithographic apparatus and a method for manufacturing a device in which a stage system is used. In the stage system a positioning system is provided comprising an actuator adapted to position an object table. The actuator comprises a magnet assembly and a coil assembly. The magnet assembly comprises a first magnetic body and a second magnetic body, which are in use subjected to a internal magnetic force. The magnet assembly has a separate interface for connecting each magnetic body to the object table separately. The magnet assembly further comprises a spacer device, which holds the first and second magnetic body at a relative distance to each other in at least the direction of the internal magnetic force.

Stage system, lithographic apparatus and device manufacturing method

A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.

Leaf spring, stage system, and lithographic apparatus

Growing community of inventors

Liempde, Netherlands

Ronald Cornelis Gerardus Gijzen