Asml Netherlands B.v.

Singulus Mastering B.v.

Rolf Hendrikus Jacobus Custers

Erik Henricus Egidius Catharina Eummelen

Yuri Johannes Gabriël Van De Vijver

Norbertus Josephus Martinus Van Den Nieuwelaar

Jorge Alberto Vieyra Salas

Bert Dirk Scholten

Victor Manuel Blanco Carballo

Pieter Lein Joseph Gunter

Ronald Frank Kox

Marijn Wouters

David Merritt Phillips

Frederik Antonius Van Der Zanden

Casper Roderik De Groot

Roland Anthony Tacken

Mark Eduard Julian Van Der Veer

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

Lithography apparatus and method of manufacturing a device

Growing community of inventors

Eindhoven, Netherlands

Rolf Hendrikus Jacobus Custers