Bmc Industries, Inc.

Buckbee-mears Company

Roland Thoms

Dean T Deibler

Thomas Ratz

Peter L Takach

A method for manufacturing a shadow mask for use in a cathode ray tube includes providing a thin metal web having a first and second major surfaces. Photosensitive layers are formed on the first and second major surfaces. The first photosensitive layer is exposed to a first patterned light and the second photosensitive layer is exposed to a second patterned light. The exposure is continued until respective accumulated exposure of the photosensitive layers reaches a predetermined value. Next, a first protective film is applied to the second photosensitive layer to prevent etching of the second surface. The first surface is then etched to form a first cavity. The first cavity has a depth that is less than a distance from the first surface to the second surface. A second protective film is applied to the first surface to prevent additional etching of the first surface. Then the first protective film is removed and the second surface is etched to form a second cavity. The second cavity communicates with the first cavity. Finally, the second protective film and the photosensitive layers are removed.

Method for manufacturing a shadow mask

An aperture mask having a grade side and a cone side with a plurality of openings of substantially the same size with the plurality of openings having a grade side partially etched region and a cone side partially etched region surrounding the plurality of openings, the grade side partially etched region surrounding the plurality of openings decreasing from the center of the mask to the periphery of the mask.

Multi-graded aperture masks

The process of forming a plurality of openings in an aperture mask by applying a layer of etchant resist to opposite surfaces of an aperture mask material, determining an overetch factor for the aperture mask, laying out a pattern of openings in the etchant resist on one side of the aperture mask, laying out a pattern of openings in the etchant resist on the opposite side of the aperture mask wherein the size of the openings on one side of the mask in the etchant resist increase while the size of the openings in the etchant resist on the opposite side decrease, and etching the aperture mask material through the openings in the etchant resist.

Multi-graded aperture mask method

A television tube having an electron gun and an aperture mask with a plurality of line of sight openings in the aperture mask wherein the line of sight openings in the aperture mask are partially defined by material on the cone side surface of the aperture mask and partially defined by material on the grade side surface of the aperture mask with the aperture opening size and shape varying in accordance with the position of the opening in the aperture mask. Two techniques known as the capital I and capital H resist layout techniques are taught to illustrate the formation of the aperture mask.

Television picture tubes

Television picture tube with aperture mask having recesses therein

A television tube having an electron gun and an aperture mask with a plurality of line of sight openings in the aperture mask wherein the line of sight openings in the aperture mask are partially defined by material on the cone side surface of the aperture mask and partially defined by material on the grade side surface of the aperture mask with the aperture mask located in the television tube with the cone side of the aperture mask facing the electron guns.

Color picture tube and aperture mask therefor

A method of making a line of sight opening in an article wherein the line of sight opening in the article is partially defined by material on one surface of the article and partially defined by material on the opposite surface of the article.

Hole technology

A process for forming openings of varying sizes in an aperture mask by determining an over-etch factor wherein the over-etch factor is determined by the time of etching through an etchant resist pattern located on opposite sides of an aperture mask material to produce an opening of predetermined size and shape followed by individually sizing the opening in the etchant resist so that etching from both sides of the aperture mask material produces etched openings of various sizes throughout the aperture with the sizing of the opening in the etchant resist characterized by having substantially constant over-etch factor even though the final openings in the aperture masks are of various sizes.

Growing community of inventors

Mullheim, Germany

Roland Thoms