Carl Zeiss Smt Gmbh

Roland Loercher

Aurelian Dodoc

Christoph Zaczek

Alexandra Pazidis

Stephan Muellender

Wilfried Clauss

Hans-Jochen Paul

Gisela Von Blanckenhagen

Sascha Migura

Joern Weber

Gerhard Braun

Karl-Stefan Weissenrieder

A mirror (') for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P&#x2032;&#x2033;) consisting of a periodic sequence of at least two periods (P) of individual layers, wherein the periods (P) include two individual layers composed of different materials for a high refractive index layer (H&#x2032;&#x2033;) and a low refractive index layer (L&#x2032;&#x2033;), wherein the layer arrangement includes at least one surface protecting layer (SPL, L) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.

Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective

A micromirror arrangement () having: at least one micromirror () having a reflective surface () formed at a mirror substrate (), and an antireflective coating () formed at the mirror substrate () outside the reflective surface (). A reflective coating () is formed within the reflective surface () and has at least two layer subsystems, wherein the first layer subsystem has layers () composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.

Micromirror arrangement having a coating and method for the production thereof

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Aalen-Hofherrnweiler, Germany

Roland Loercher