Schott Glaswerke

Hoffmann-la Roche Inc.

Schott Ag

Carl-zeiss-stiftung

Roland Hochhaus

Martin Heming

Volker Paquet

Jurgen Otto

Bernd Hoppe

Christof Fattinger

Ralf T Kersten

Johannes Segner

Gerhard Hahn

Friedrich-Georg Schroeder

Hans-Walter Abraham

Dieter Krause

Hermann Lemm

Bernd Weitzel

Marten Walther

Lars Bewig

Burkhard Danielzik

Hartmut Bauch

Markus Kuhr

Wolfgang M&ouml;hl

Thomas K{umlaut Over (u)}pper

In the process for partially shaping, a glass/glass ceramic article () is held on a planar support plate () by suction. The glass/glass ceramic article is heated to soften it, so that it has a viscosity below 10dPa&#xb7;s. After the softening one or more shaping dies () is or are moved upward through an opening or respective openings () in the support plate to form raised regions in the softened glass/glass ceramic article (). The suction force is produced by a low pressure in a hollow compartment () below the support plate () and acts on the glass/glass ceramic article () by means of a gap (G) formed between each shaping die () and the support plate. Additional openings can be provided in the support plate and/or in one or more of the shaping dies to assist in applying the suction force to the glass/glass ceramic article. After solidification of the softened glass/glass-ceramic article the shaping die or dies () is or are withdrawn. Then the partially shaped glass/glass ceramic product is removed by compressed air and/or mechanically with lifting members (). An apparatus for performing this process is also described.

Process for partial shaping of flat glass or glass-ceramic articles and apparatus for performing same

The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.

Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process

An optical waveguide is disclosed with a substantially planar substrate and a waveguide layer applied to the substrate. The invention resides in that the substrate consists of a synthetic resin or of a material having a high organic proportion. This has the advantage that the high index of refraction of the inorganic waveguide layer is combined with the material properties of the synthetic resin substrate, such as, for example, breaking resistance, plastic and thermoplastic moldability, photochemical structuring ability, and others.

Optical waveguide with a substantially planar substrate and process for

Optical inorganic waveguide with a substantially planar organic substrate

A process is disclosed for the production of an optical thin film waveguide of TiO.sub.2 with an attenuation of &lt;5 dB/cm on a planar inorganic substrate wherein the thin film waveguide is produced by a microwave plasma CVD process (PCVD).

Process for the production of a thin film optical waveguide of TiO.sub.2

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Mainz, Germany

Roland Hochhaus