Leica Microsystems Wetzlar Gmbh

Leica Microsystems Semiconductor Gmbh

Kla-tencor Mie Gmbh

Leica Mikroskopie Und Systems Gmbh

Roland Hedrich

Ulrich Kaczynski

Joachim Wienecke

Lambert Danner

Albert Kreh

Henning Backhauss

Wolfgang Vollrath

Gerhard Hoppen

Karsten Urban

Kurt Hahn

Christof Krampe-Zadler

Hermann Bittner

Alexander Büttner

An apparatus () for the optical inspection of wafers is disclosed, which comprises an assembly unit () which carries optical elements () of at least one illumination path () for a bright field illumination and optical elements () of at least one illumination path () for a dark field illumination. The assembly unit () furthermore carries plural optical elements () of at least one detection path (). An imaging optical element () of the at least one illumination path () for the bright field illumination (), imaging optical elements () of the at least one illumination path for the dark field illumination, and imaging optical elements () of the at least one detection path () are designed in such a way that all illumination paths () and all detection paths () are telecentric.

Apparatus for the optical inspection of wafers

The invention concerns a system operating unit () having a column () that is attachable by way of at least two supports () to different points of a system housing (). In the preferred embodiment, this column is attached laterally to the housing, the supports serving for attachment to the housing of the system. In addition, a retaining bracket () is connected to the column () in such a way that a horizontal deflection of the retaining bracket () about a vertical axis is possible.

System operating unit

The invention concerns a microscope with a capability for switching between the deep ultra-violet and the visible spectral region having a displaceable tube lens changer ( ) with at least one tube lens ( ) for the IV light region and at least one tube lens ( ) for the visible light region and additionally having a reflector carrier having multiple reflectors ( ) arranged shiftably in the illuminating beam path on said reflector carrier ( ). The reflector carrier ( ) on the one hand and the tube lens changer ( ) on the other hand are mechanically coupled to one another in such a way that shifting the reflector carrier ( ) in the illuminating beam path to a specific reflector ( ) automatically displaces the tube lens changer ( ) in such a way that the latter arranges in the optical axis ( ) a tube lens ( ) corresponding to the reflector ( ).

Microscope

The invention relates to an inspection microscope for the semiconductor industry. The microscope stand consists of a foot (,), a pillar (,) and a crosshead (,). In order to facilitate unobstructed feeding of samples from the back part of the microscope stand, the pillar (,) is mounted laterally next to the back end of the foot (,) and the crosshead (,) arranged thereon when seen from the front. This makes it possible to save space and avoid adaptations when integrating the microscope stand into the clusters in the test area of the semiconductor industry and to feed test objects directly from the back of the microscope stage (,). In an especially advantageous construction of the stand, the inspection microscope is particularly suitable for examining large-surface objects (e.g. flat screens or 400 nm wafers).

Microscope stand for a wafer inspection microscope

A limit switching apparatus with defined overtravel for specimen-objective protection on microscopes having a motorized focusing drive. A stored focus position or position of the specimen stage can be overtraveled by a fixed amount. The maximum travel path of the specimen stage is additionally limited by a switching rod and a short-circuiting switch, in order to ensure reliable specimen-objective protection even in the event of a fault in the control electronics.

Limit switching apparatus with defined overtravel for specimen

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Ehringshausen, Germany

Roland Hedrich