Asml Netherlands B.v.

Roland Blok

Alex Oudshoorn

Erik Roelof Loopstra

Leon Martin Levasier

The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.

Device manufacturing method, lithographic apparatus and a computer program

A device manufacturing method includes exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, determining a non-linear function for approximating a height and a tilt profile of a surface of the reticle with respect to the reticle stage, and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function.

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Eindhoven, Netherlands

Roland Blok