Mapper Lithography IP B.v.

Rogier Martin Lambert Ellenbroek

Guido De Boer

Jerry Johannes Martinus Peijster

The invention relates to a vibration isolation module () for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (), an intermediate body () and a support body () for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod () such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.

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Delfgauw, Netherlands

Rogier Martin Lambert Ellenbroek