Asml Netherlands B.v.

Rogier Hendrikus Magdalena Cortie

Michel Riepen

Cornelius Maria Rops

Jim Vincent Overkamp

Nicolaas Ten Kate

Fabrizio Evangelista

Erik Henricus Egidius Catharina Eummelen

Theodorus Wilhelmus Polet

Thibault Simon Mathieu Laurent

Ruud Hendrikus Martinus Johannes Bloks

Koen Cuypers

Raymond Wilhelmus Louis Lafarre

Paulus Martinus Maria Liebregts

Siegfried Alexander Tromp

David Bessems

Van Vuong Vy

Johannes Henricus Wilhelmus Jacobs

Koen Steffens

Martijn Houben

Niek Jacobus Johannes Roset

Adrianus Hendrik Koevoets

Giovanni Luca Gattobigio

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Gerben Pieterse

Gheorghe Tanasa

Christianus Wilhelmus Johannes Berendsen

Mark Johannes Hermanus Frencken

Henricus Jozef Castelijns

Harold Sebastiaan Buddenberg

Evert Van Vliet

Pepijn Van Den Eijnden

Floor Lodewijk Keukens

Marcel Maria Cornelius Franciscus Teunissen

Jantien Laura Van Erve

Johan Gertrudis Cornelis Kunnen

Jimmy Matheus Wilhelmus Van De Winkel

Marcus Johannes Van Der Zanden

Stef Marten Johan Janssens

Patricius Jacobus Neefs

Sudhir Srivastava

Hendrikus Johannes Schellens

Ralph Joseph Meijers

Theodorus Johannes Antonius Renckens

Putra Saputra

Adrianus Marinus Wouter Heeren

Bo Lenssen

Michael Johannes Hendrika Wilhelmina Renders

Paul Willems

Sjoerd Nicolaas Lambertus Donders

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Andre Bernardus Jeunink

Christian Wagner

Nina Vladimirovna Dziomkina

Laurentius Johannes Adrianus Van Bokhoven

Takeshi Kaneko

Jeroen Gerard Gosen

Adrianes Johannes Baeten

Sandra Van Der Graaf

Adrianus Marinus Verdonck

Daniel Elza Roeland Audenaerdt

Rob Cornelissen

A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

A lithographic apparatuscomprisingincludesan object tablewhich carries an object. The lithographic apparatus may furthercomprise at least oneinclude asensoras part of a measurement systemto measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimatetheadeformation oftheanobject due toavaryingloadsloadduring operation of the lithographic apparatus, for exampleavaryingloadsloadinduced by a two-phase flow in a channel formedwithinofthe object table.Additionally, or alternatively, theThelithographic apparatuscomprisesmay includea predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used toprovide apatterna substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

Lithographic apparatus and an object positioning system

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

Fluid handling structure, lithographic apparatus and device manufacturing method

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A lithographic apparatus comprising: a channel () for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (); a second material () between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material () between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

Lithographic apparatus and method of manufacturing a lithographic apparatus

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

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Ittervoort, Netherlands

Rogier Hendrikus Magdalena Cortie