International Business Machines Corporation

Roger Y Tsai

Cyril Cabral, Jr

Hariklia Deligianni

Emanuel Israel Cooper

Judith Marie Rubino

Andrew John Kellock

Stefanie Ruth Chiras

Dureseti Chidambarrao

Mark Alan Lavin

Fook-Luen Heng

Rama Nand Singh

Jin-Fuw Lee

A methodology for obtaining improved prediction of CA resistance in electronic circuits and, particularly, an improved CA resistance model adapted to capture larger than anticipated 'out of spec' regime. In one embodiment, a novel bucketization scheme is implemented that is codified to provide a circuit designer with considerably better design options for handling large CA variability as seen through the design manual. The tools developed for modeling the impact of CA variable resistance phenomena provide developers with a resistance model, such as conventionally known, modified with a new CA model Basis including a novel CA intrinsic resistance model, and, a novel CA layout bucketization model.

CA resistance variability prediction methodology

A composite material comprising a layer containing copper, and an electrodeposited CoWP film on the copper layer. The CoWP film contains from 11 atom percent to 25 atom percent phosphorus and has a thickness from 5 nm to 200 nm. The invention is also directed to a method of making an interconnect structure comprising: providing a trench or via within a dielectric material, and a conducting metal containing copper within the trench or the via; and forming a CoWP film by electrodeposition on the copper layer. The CoWP film contains from 10 atom percent to 25 atom percent phosphorus and has a thickness from 5 nm to 200 nm. The invention is also directed to a interconnect structure comprising a dielectric layer in contact with a metal layer; an electrodeposited CoWP film on the metal layer, and a copper layer on the CoWP film.

Electroplated CoWP composite structures as copper barrier layers

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Yorktown Heights, NY, United States of America

Roger Y Tsai