Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Roelof Frederik De Graaf

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Martinus Hendrikus Antonius Leenders

Jan-Gerard Cornelis Van Der Toorn

Bob Streefkerk

Michel Riepen

Martinus Cornelis Maria Verhagen

Hans Jansen

Franciscus Johannes Herman Maria Teunissen

Nicolaas Ten Kate

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Frits Van Der Meulen

Herman Vogel

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Jacobus Johannus Leonardus Hendricus Verspay

Paulus Martinus Maria Liebregts

Edwin Augustinus Matheus Van Gompel

Antonius Johannus Van Der Net

Joost Jeroen Ottens

Patricius Aloysius Jacobus Tinnemans

Johannes Henricus Wilhelmus Jacobs

Franciscus Johannes Joseph Janssen

Marco Polizzi

Hernes Jacobs

Bauke Jansen

Peter Smits

Sebastiaan Maria Johannes Cornelissen

Hubertus Leonardus Franciscus Heusschen

Marco Koert Stavenga

Marcus Adrianus Van De Kerkhof

Nina Vladimirovna Dziomkina

Martijn Houben

Paul Petrus Joannes Berkvens

Edwin Van Gompel

Niek Elout De Kruijf

Jurgen Benischek

Gerardus Martinus Antonius De Rooij

Vijay Kumar Badam

Johanna Antoinette Maria Sondag-Huethorst

Jeroen Johannes Sophia M Mertens

Johannes Catharinus Hubertus Mulkens

Marcel Beckers

Koen Steffens

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Marcio Alexandre Cano Miranda

Han Henricus Aldegonda Lempens

Kornelis Tijmen Hoekerd

Daniel Jozef Maria Direcks

Anthonie Kuijper

Patrick Johannes Wilhelmus Spruytenburg

Pieter Jacob Kramer

Gert-Jan Gerardus Johannes Thomas Brands

Christophe De Metsenaere

Paul William Scholtes-Van Eijk

Arjan Hubrecht Josef Anna Martens

Sandra Van Der Graaf

Mathieus Anna Karel Van Lierop

Joris Johan Anne-Marie Verstraete

David Lucien Anstotz

Alexandre Viktorovych Padiy

Sjoerd Donders

Jeroen Mertens

Martinus Leenders

Henrikus Cox

Stefan Belfroid

Franciscus Teunissen

Martinus Verhagen

Johannes Smeulers

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Lithographic apparatus and device manufacturing method

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

Lithographic apparatus and in-line cleaning apparatus

A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.

Growing community of inventors

Veldhoven, Netherlands

Roelof Frederik De Graaf